Browse > Article
http://dx.doi.org/10.3745/KIPSTD.2004.11D.3.709

An Intelligent Monitoring System of Semiconductor Processing Equipment using Multiple Time-Series Pattern Recognition  

Lee, Joong-Jae (숭실대학교 대학원 컴퓨터학과)
Kwon, O-Bum ((주)임프 연구)
Kim, Gye-Young (숭실대학교 컴퓨터학부)
Abstract
This paper describes an intelligent real-time monitoring system of a semiconductor processing equipment, which determines normal or not for a wafer in processing, using multiple time-series pattern recognition. The proposed system consists of three phases, initialization, learning and real-time prediction. The initialization phase sets the weights and tile effective steps for all parameters of a monitoring equipment. The learning phase clusters time series patterns, which are producted and fathered for processing wafers by the equipment, using LBG algorithm. Each pattern has an ACI which is measured by a tester at the end of a process The real-time prediction phase corresponds a time series entered by real-time with the clustered patterns using Dynamic Time Warping, and finds the best matched pattern. Then it calculates a predicted ACI from a combination of the ACI, the difference and the weights. Finally it determines Spec in or out for the wafer. The proposed system is tested on the data acquired from etching device. The results show that the error between the estimated ACI and the actual measurement ACI is remarkably reduced according to the number of learning increases.
Keywords
Semiconductor; Processing Equipment; Monitoring System; Pattern Recognition; DTW(Dynamic Time Warping); LBG(Linde-Buzo-Gray); Clustering;
Citations & Related Records
연도 인용수 순위
  • Reference
1 T. J. Knight, D. W. Greve, X. Cheng and B. H. Krogh, 'Real-time multivariable control of PECVD silicon nitride film properties,' IEEE Transaction on Semiconductor Manufacture, Vol.10, No.1, pp.137-145, February, 1997   DOI   ScienceOn
2 P. J. O'Sullivan, J. Martinez, J. Durham and S. Felker, 'Using UPM for real-time multivariate modeling of semiconductor manufacturing equipment,' SEMATECH APC/AEC Workshop VII, New Oeleans, Louisiana, pp.5-8, November, 1995
3 E. A. Rietman, 'A neural network model of a contact plasma etch process for VLSI production,' IEEE Transaction on Semiconductor Manufacture, Vol.9, No.1, pp.95-100, February, 1996   DOI   ScienceOn
4 Suttipan Limanond, Jennie Si and Kostas Tsakalis, 'Monitoring and control of semicondutor manufacturing processes,' IEEE Control System Magazine, Vol.8, No.6, pp.46-58, December, 1998   DOI   ScienceOn
5 Sylvie Bosch-Charenay, Jiazhan Xu, John Haigis, Peter A. Resenthal, Peter %R. Solomon, and James M. Bustillo, 'Real-time etch-depth measurements of MEMS devices,' Journla of Mocroelectromechanical systems, Vol.110, No.2, pp.111-117, April, 2002   DOI   ScienceOn
6 T. L. Vincent, P. P. Khargonekar and F. L. Terry, Jr., 'An extended Kalman filtering-based method of processing reflectometry data fro fast In-Situ Rate Measurements,' IEEE Transaction on Semiconductor Manufacture, Vol.10, No.1, pp.137-145, February, 1997   DOI   ScienceOn
7 H. Sake and S. Chiba, 'Dynamic programming algorithm optimization for spoken word recognition,' IEEE Transactions on Acoustic, Speech, and Signal Processing, Vol.26, No.1, pp.43-49, 1978   DOI
8 Richard P. Lippmann, 'An introduction to computing with neural nets,' IEEE ASSP Magazine, pp.4-22, April, 1987
9 G. W. Gates, 'The reduced nearest neighbor rule,' IEEE transactions on Information Theory, Vol.13, No.1, pp.21-27, 1972   DOI   ScienceOn