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http://dx.doi.org/10.5369/JSST.2006.15.3.153

Photoresist spray coating for three-dimensional micro structure  

Kim, Do-Wook (School of Electrical Engineering and Computer Science, Kyungpook National Univ.)
Eun, Duk-Su (School of Electrical Engineering and Computer Science, Kyungpook National Univ.)
Bae, Young-Ho (Department of Electronics, Uiduk Univ.)
Yu, In-Sik (Department of Mobile Information Communication, Kyungdong College of Techno-information)
Suk, Chang-Gil (Ultech. Co., Ltd.)
Jeong, Jong-Hyun (School of Electrical Engineering and Computer Science, Kyungpook National Univ.)
Cho, Chan-Seop (Department of Electronics, Sangju National Uinv.)
Lee, Jong-Hyun (School of Electrical Engineering and Computer Science, Kyungpook National Univ.)
Publication Information
Journal of Sensor Science and Technology / v.15, no.3, 2006 , pp. 153-157 More about this Journal
Abstract
This paper presents the method for three-dimensional micro structure with photoresist spray coating system. The system consists of a high temperature rotational chuck, ultrasonic spray nozzle module, angle control module and nozzle moving module. Spray coating system is effected by several parameters such as the solid contents, the dispensed volume, the scanning speed of the spray nozzle and the wafer of dimension. The photoresist (AZ 1512) has been coated on the three-dimensional micro structure by spray coating system and the characteristics have been evaluated.
Keywords
photolithography; three-dimensional micro structure; photoresist spray coating;
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