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http://dx.doi.org/10.5369/JSST.2005.14.1.022

Fabrication and characteristics of micro-machined thermoelectric flow sensor  

Lee, Young-Hwa (Department of Material Engineering, Chungnam National University)
Roh, Sung-Cheoul (Thermo-Fluid System Department, Korea Institute of Machinery and Materials)
Na, Pil-Sun (Department of Material Engineering, Chungnam National University)
Kim, Kook-Jin (Division of Electromagnetic Metrology, Korea Research Institute of Standards and Science)
Lee, Kwang-Chul (Division of Electromagnetic Metrology, Korea Research Institute of Standards and Science)
Choi, Yong-Moon (Division of Physical Metrology, Korea Research Institute of Standards and Science)
Park, Se-Il (Division of Electromagnetic Metrology, Korea Research Institute of Standards and Science)
Ihm, Young-Eon (Department of Material Engineering, Chungnam National University)
Publication Information
Journal of Sensor Science and Technology / v.14, no.1, 2005 , pp. 22-27 More about this Journal
Abstract
A thermoelectric flow sensor for small quantity of gas flow rate was fabricated using silicon wafer semiconductor process and bulk micromachining technology. Evanohm R alloy heater and chromel-constantan thermocouples were used as a generation heat unit and sensing parts, respectively. The heater and thermocouples are thermally isolated on the $Si_{3}N_{4}/SiO_{2}/Si_{3}N_{4}$ laminated membrane. The characteristics of this sensor were observed in the flow rate range from 0.2 slm to 1.0 slm and the heater power from 0.72 mW to 5.63 mW. The results showed that the sensitivities $(({\partial}({\Delta}V)/{\partial}(\dot{q}));{\;}{\Delta}V$ : voltage difference, $\dot{q}$ : flow rate) were increased in accordance with heater power rise and decreasing of flow rate.
Keywords
thermoelectric flow sensor; sensitivity; flow rate; KOH anisotropic etching;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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