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http://dx.doi.org/10.5369/JSST.2002.11.2.084

Design and Fabrication of 32x32 Foveated CMOS Retina Chip for Edge Detection with Local-Light Adaptation  

Park, Dae-Sik (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Park, Jong-Ho (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Kim, Kyung-Moon (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Lee, Soo-Kyung (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Kim, Hyun-Soo (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Kim, Jung-Hwan (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Lee, Min-Ho (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
Shin, Jang-Kyoo (School of Electronic and Electrical Engineering, Kyungpook National Univ.)
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Abstract
A $32{\times}32$ pixels foveated (linear-polar) structure retina chip with the function of local-light adaptation for edge detection has been designed and fabricated using CMOS technology. Human retina can detect a wide range of light intensity. In this study, we use the biologically-inspired visual signal processing mechanism that consists of photoreceptors, horizontal cells, and bipolar cells in order to implement the function of edge detection in the retina chip. For a local-light adaptive function, the size of receptive field is changed locally according to the input light intensity. The spatial distribution of sensing pixels in the foveated retina chip has the advantages of selective reduction of image data and good resolution in central part to carry out the elaborate image processing with still enough resolution in the outer parts. The designed chip has been fabricated using standard $0.6\;{\mu}m$ double-poly triple-metal CMOS technology and optimized using HSPICE simulator.
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