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http://dx.doi.org/10.6109/jkiice.2017.21.8.1465

Drain Induced Barrier Lowering(DIBL) SPICE Model for Sub-10 nm Low Doped Double Gate MOSFET  

Jung, Hakkee (Department of Electronic Engineering, Kunsan National University)
Publication Information
Journal of the Korea Institute of Information and Communication Engineering / v.21, no.8, 2017 , pp. 1465-1470 More about this Journal
Abstract
In conventional MOSFETs, the silicon thickness is always larger than inversion layer, so that the drain induced barrier lowering (DIBL) is expressed as a function of oxide thickness and channel length regardless of silicon thickness. However, since the silicon thickness is fully depleted in the sub-10 nm low doped double gate (DG) MOSFET, the conventional SPICE model for DIBL is no longer available. Therefore, we propose a novel DIBL SPICE model for DGMOSFETs. In order to analyze this, a thermionic emission and the tunneling current was obtained by the potential and WKB approximation. As a result, it was found that the DIBL was proportional to the sum of the top and bottom oxide thicknesses and the square of the silicon thickness, and inversely proportional to the third power of the channel length. Particularly, static feedback coefficient of SPICE parameter can be used between 1 and 2 as a reasonable parameter.
Keywords
drain induced barrier lowering; SPICE; double gate MOSFET; static feedback coefficient;
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Times Cited By KSCI : 1  (Citation Analysis)
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