1 |
S.H.Chou, M.L.Fan and P.Su, "Investigation and Comparison of Work Function Variation for FinFET and UTB SOI Devices Using a Voronoi Approach," IEEE Trans. Electron Devices, vol. 60, no.4, pp.1485-1489, 2013.
DOI
|
2 |
Z.Ding, G.Hu, J.Gu, R.Liu, L.Wang and T.Tang,"An analytical model for channel potential and subthreshold swing of the symmetric and asymmetric double-gate MOSFETs," Microelectronics J., vol.42, pp.515-519, 2011.
DOI
ScienceOn
|
3 |
D.S.Havaldar, G.Katti, N.DasGupta and A.DasGupta, "Subthreshold Current Model of FinFETs Based on Analytical Solution of 3-D Poisson's Equation," IEEE Trans. Electron Devices, vol. 53, no.4, 2006.
|
4 |
H.K.Jung and D.S.Cheong,"Analysis for Relation of Oxide Thickness and Subthreshold Swing of Asymmetric Double Gate MOSFET," Conference on Information and Communication Eng., vol.17, no.2, pp.698-701, 2013.
|
5 |
G. Deng anf C. Chen, "Binary Multiplication Using Hybrid MOS and Multi-Gate Single-Electron Transistors", IEEE Trans. on VLSI systems, vol.21, no.9, pp.1573-1582, 2013.
DOI
ScienceOn
|
6 |
P.Zhang, E.Jacques, R.Rogel and O.Bonnaud, "P-type and N-type multi-gate polycrystalline silicon vertical thin film transistors based on low-temperature," Solid-state electronics, vol.86, no.1, pp.1-5, 2013.
DOI
ScienceOn
|
7 |
S.Jandhyala and S.Mahapatra,"Inclusion of body doping in compact models for fully-depleted common double gate MOSFET adapted to gate-oxide thickness asymmetriy", Electronics Lett., vol.48, no.13, pp.794-795, 2012.
DOI
ScienceOn
|