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http://dx.doi.org/10.6109/jkiice.2012.16.8.1747

Study on Lowering of the Polarization in SiOC Thin FIlms by Post Annealing  

Oh, Teresa (청주대학교)
Publication Information
Journal of the Korea Institute of Information and Communication Engineering / v.16, no.8, 2012 , pp. 1747-1752 More about this Journal
Abstract
The SiOC film of carbon centered system was prepared using bistrimethylsilylmethane (BTMSM) and oxygen mixed precursor by the chemical vapor deposition. The dielectric constant is measured by MIS(metal/insulator/Si) structure, but it could decrease the reliability because the uniformity is not assured. To research the dielectric constant of SiOC film, the range of low polarization was researched in SiOC film using the optical analysis and hardness, and then calculated the dielectric constant of SiOC film with amorphous structure of high degree. After annealing, the dielectric constant of SiOC film was decreased owing to the lowering of polarization, and FTIR spectra of the main bond was shifted to higher wave number. The main bond of 950~1200 cm-1 was composed of the Si-C and Si-O bonds. The intensity increases in Si-O bond infers the bonding strength became stronger than that of deposited film. Annealed SiOC film showed 2.06 in dielectric constant.
Keywords
AZO; SiOC; Polarity; FTIR analysis; Reflectance; PMMA;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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