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http://dx.doi.org/10.6109/jkiice.2012.16.3.558

Effects of Doping Concentrations and Annealing Temperatures on the Electrical and Optical Properties of Ga-doped ZnO Thin Films by Sol-gel Method  

Kang, Seong-Jun (전남대학교 전기 및 반도체 공학과)
Joung, Yang-Hee (전남대학교 전기 및 반도체 공학과)
Abstract
We fabricated Ga doped ZnO (GZO) thin films on the glass substrate (Eagle 2000) with various of Ga doping concentration and annealing temperatures using sol-gel method, electrical and optical properties were investigated. When the GZO thin films doped with 1 mol% of Ga and annealed at $600^{\circ}C$, the excellent (002) orientation was observed. In the results of Hall measurement, carrier concentration decreased and resistivity increased due to segregation effect with increasing of the Ga doping concentration. The largest carrier concentration and lowest resistivity were $9.13{\times}10^{18}cm^{-3}$ and $0.87{\Omega}cm$, respectively, in the GZO thin films doped with 1 mol% Ga and annealed at $600^{\circ}C$. All films is higher than 80 % in the visible light region. Energy band gap narrowing due to Burstein-Moss effect was observed with increasing of Ga doping concentration from 1 to 4 mol%.
Keywords
Sol-gel method; TCO thin film; GZO thin film; Resistivity; Transmittance; Burstein-Moss effect;
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