Browse > Article
http://dx.doi.org/10.6109/jkiice.2010.14.1.191

A Study on the High Quality and Low Cost Fabrication Technology of ZnO Thin Films for Solar Cell Applications  

Lee, Jae-Hyeong (군산대학교 전자정보공학부)
Abstract
Aluminum doped zinc oxide (AZO) films have been prepared on Coming 7059 glass substrates by r.f. magnetron sputtering method. A powder target instead of a conventional sintered ceramic target was used in order to improve the utilization efficiency of the target and reduce the cost of the film deposition process. The influence of sputter pressure on the structural, electrical, and optical properties of AZO films were studied. The AZO films had hexagonal wurtzite structure with a preferred c-axis orientation, regardless of sputter pressure and target types. The crystallinity and degree of orientation was increased by increasing the sputter pressure. For higher sputtering pressures, a reduction of the resistivity was observed due to a increase on the mobility and the carrier concentration. The lowest resistivity of $6.5{\times}10^{-3}\;{\Omega}-cm$ and the average transmittance of 80% can be obtained for films deposited at 15 mTorr.
Keywords
Aluminum doped zinc oxide (AZO) film; magnetron sputter; Powder target; solar cell;
Citations & Related Records
연도 인용수 순위
  • Reference
1 J.A Thomton, "Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings", J. Vac. Sci. Technol., vol. 12, pp.830-835, 1975.   DOI
2 Chris G. Van de Walle. "Hydrogen as a Cause of Doping in Zinc Oxide", The American Physical Society, Vol, 85, No. 5, pp. 1012-1015, 2000
3 B. Rech, S. Wieder, C. Beneking, A Loffl, O. Kluth, W. Reetz, H. Wagner, "Controlled nucleation of thin microcrystalline layers for the recombination junction in a-Si stacked cells " Proc. 26th IEEE Photovoltaic Specialists Conf., Anaheim, CA, p.619, 1997.
4 X. Hao, J. Ma, D. Zhang, T. Yang, H. Ma, Y. Yang, C. Cheng, J. Huang, "Thickness dependence of structural, optical and electrical properties of ZnO:AI films prepared on flexible substrates", Appl. Surf. Sci., vol. 183, pp. 137-142, 2001.   DOI   ScienceOn
5 I. Sieber, N. Wanderka, I. Urban, I. Dorfel, E. Schierhorn, F. Fenske, W. Fuhs, "Electron microscopic characterization of reactively sputtered Zno films with different Al-doping levels", Thin Solid Films, vol. 330, pp.108-113, 1998.   DOI   ScienceOn
6 O. Kluth, B. Rech, S. Wieder, C. Beneking, H. Wagner, S. Loffl, H. W. Schock, "Recent developments of silicon thin film solar cells on glass substrates" 2nd Int. Conf. Coatings on Glass, Saarbrucken, 1998.
7 Seung Yeop Myong and Koeng Su Lim, "Highly stable and textured hydrogenated ZnO thin films", Appl, Phys, Letters, vol. 82, no. 18, pp,3026-3028, 2003.   DOI   ScienceOn
8 Y. K. Yang, "A method of increasing the utilization ratio of planar magnetron sputtering targets", Surf. Coat. Technol. vol. 37, pp.315-319, 1989.   DOI   ScienceOn
9 R. D. Bland, G. J. Kominiak, and D. M. Mattox, "Effect of ion bombardment during deposition on thick metal and ceramic deposits", J. Vac. Sci. Technol., vol, 11 pp.671-674, 1974.   DOI
10 J.A. Thornton, "Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings", J. Vac. Sci. Technol., vol. 11, pp.666-670, 1974.   DOI
11 T. Minami, "Substitution of transparent conducting oxide thin films for indium tin oxide transparent electrode applications", Thin Solid Films, vol. 516, pp.1314-1321, 2008.   DOI   ScienceOn
12 B.A. Movchan, A.V. Demchishin, Phys. Met. Metalling 28 (1969) 83.