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http://dx.doi.org/10.6109/JKIICE.2009.13.1.115

Influence of substrate temperatures on optical and electrical properties of ZnO:Al thin films  

Chung, Yeun-Gun (전남대학교 정보소재공학과)
Joung, Yang-Hee (전남대학교 전기 및 반도체 공학과)
Kang, Seong-Jun (전남대학교 전기 및 반도체 공학과)
Publication Information
Journal of the Korea Institute of Information and Communication Engineering / v.13, no.1, 2009 , pp. 115-120 More about this Journal
Abstract
The 3wt.% Al-doped zinc oxide (AZO) thin films were fabricated on Coming 1737 substrates at a fixed oxygen pressure of 200 mTorr with various substrate temperatures ($100\;{\sim}\;250^{\circ}C$) by using pulsed laser deposition in order to investigate the microstructure, optical, and electrical properties of AZO thin films. All thin films were shown to be c-axis oriented, exhibiting only a (002) diffraction peak. The AZO thin film, fabricated at 200 mTorr and $250^{\circ}C$, showed the highest (002) orientation and the full width at half maximum (FWHM) of the (002) diffraction peak was $0.44^{\circ}$. The optical transmittance in the visible region was higher than 85 %. The Burstein-Moss effect, which shifts to a high photon energy, was observed. The electrical property indicated that the highest carrier concentration ($3.48{\times}10^{20}cm^{-3}$) and the lowest resistivity ($1.65{\times}10^{-2}{\Omega}cm$) were obtained in the AZO thin film fabricated at 200 mTorr and $250^{\circ}C$.
Keywords
TCO; Al-doped Zno; Pulsed laser deposition; Hall effect; Transmittance;
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  • Reference
1 M. Chena, Z. L. Pei, X. Wang, C. and L. S. Wen, "Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputtering", J. Vac. Sci. Technol. A, 19, Issue 3, pp. 963-970, (2001)   DOI   ScienceOn
2 A. Martin, J.P. Espinos, A. Justo, J. P. Holgado, F. Yubero, A.R. Gonzalez-Elipe, "Preparation of transparent and conductive Al-doped ZnO thin films by ECR plasma enhanced CVD", Surface&coatings technology, 151-152, pp. 289-293, (2002)   DOI
3 Z.Y. Ning, S.H. Cheng, S.B. Ge, y. Chao, Z.Q. Gang, Y.X. Zhang, Z.G. Liu, "Preparation and characterization of ZnO:Al films by pulsed laser deposition", thin solid films, 307, pp.50-53 (1997)
4 F. K. Shan, B. I. Kim, G. X. Liu, Z. F. Liu, J. Y. Sohn, W. J. Lee, B. C. Shin, and Y. S. Yu, "Blueshift of near band edge emission in Mg doped ZnO thin films and aging", J. Appl. phys, 95, pp. 4772, (2004)
5 J. H. Park, H. H. Pak, C. R. Cho, "Deposition- Temperature Effects on AZO Thin Films Prepared by RF Magnetron Sputtering and Their Physical Properties", J. Korean. Phys. Soc. 49, s584, (2006)
6 H. D. Ko, W. P. Tai, K. C. Kim, S. H. Kim, S. J. Suh, Y. S. Kim, "Growth of Al-doped ZnO thin films by pulsed DC magnetron sputtering", J. Cryst. growth, 277, pp. 352-358, (2005)   DOI   ScienceOn
7 Y. M. Chung, C. S. Moon, W. S. Junga and J. G. Han, "The low temperature synthesis of Al doped ZnO films on glass and polymer using pulsed co-magnetron sputtering: H2 effect", thin solid films, 515, pp.567-570, (2006)   DOI   ScienceOn
8 Z .Q. Xu, H. Deng, Y. Li, Q. H. Guo, Y. R. Li, "Characteristics of Al-doped c-axis orientation ZnO thin films prepared by the sol–gel method", Materials Research Bulletin, 41, pp.354-358, (2006)   DOI   ScienceOn
9 K. H. Kim, K. C. Park, D. Y. Ma, "Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by radio frequency magnetron sputtering", J. Appl. Phys, 81, pp. 7764-7772, (1997)   DOI   ScienceOn
10 A. I. Ali,C. H. Kim, J. H. Cho and Bog G. Kim, "Growth and Characterization of ZnO:Al Thin Film Using RF Sputtering for Transparent Conducting Oxide", J. Korean. Phys. Soc. 49, s652, (2006)
11 G. Srinivasan, R.T. Rajendra Kumar, J. Kumar, "Influence of Al dopant on microstructure and optical properties of ZnO thin films prepared by sol–gel spin coating method", optical materials, 30, pp. 314-317, (2007)   DOI   ScienceOn
12 E. G. Fu, D. M. Zhuang, G. Zhang, W. F. Yang, M. Zhao, "Substrate temperature dependence of the properties of ZAO thin films deposited by magnetron sputtering", Appl. Surf. Sci, 217, pp.88-94, (2003)   DOI   ScienceOn
13 Wei Li, Yun Sun, Yaxin Wang, HongKun Cai, Fangfang Liu, Qing He, "Effects of substrate temperature on the properties of facing-target sputtered Al-doped ZnO films", Solar Energy Materials & Solar cells, 91, pp.659-663 (2007)   DOI   ScienceOn
14 F. K. Shan, G. X. Liu, W. J. Lee, B. C. Shin, "Structural, Optical and Electrical Properties of Transparent Conductive In2O3-Doped ZnO Thin Films Grown by Pulsed Laser Deposition", J. Korean. Phys. Soc, 50, pp. 626-631, (2007)   DOI   ScienceOn
15 Z. Y. Ning, S. H. Cheng, S. B. Ge, Y. Chao, Z. Q. Gang, Y. X. Zhang, Z. G. Liu, "Preparation and characterization of ZnO:Al films by pulsed laser deposition", thin solid films, 307, pp. 50-53, (1997)   DOI   ScienceOn
16 Shou-Yi Kuo, Wei-Chun Chen, Fang-I Lai, Chin-Pao Cheng, Hao-Chung Kuo, Shing-Chung Wang, Wen- Feng Hsieh, "Effects of Doping Concentration and Annealing Temperature on Properties of Highly- oriented Al-doped ZnO films", J. Cryst. Growth, 287, pp. 78-84, (2006)   DOI   ScienceOn
17 R.K. Shukla, Anchal Srivastava, Atul Srivastava, K.C. Dubey, "Growth of transparent conducting nanocrystalline Al doped ZnO thin films by pulsed laser deposition", J. Cryst. Growth, 294, pp.427-431, (2006)   DOI   ScienceOn
18 Xin Chen, Wenjie Guan, Guojia Fang, X.Z. Zhao "Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition", Appl. Surf. Sci. 252, pp.1561-1567, (2005)   DOI   ScienceOn