Browse > Article

Real-time Fault Detection and Classification of Reactive Ion Etching Using Neural Networks  

Ryu Kyung-Han (명지대학교 전자공학과)
Lee Song-Jae (명지대학교 전자공학과)
Soh Dea-Wha (명지대학교 전자공학과)
Hong Sang-Jeen (명지대학교 전자공학과)
Publication Information
Journal of the Korea Institute of Information and Communication Engineering / v.9, no.7, 2005 , pp. 1588-1593 More about this Journal
Abstract
In coagulant control of water treatment plants, rule extraction, one of datamining categories, was performed for coagulant control of a water treatment plant. Clustering methods were applied to extract control rules from data. These control rules can be used for fully automation of water treatment plants instead of operator's knowledge for plant control. To perform fuzzy clustering, there are some coefficients to be determined and these kinds of studies have been performed over decades such as clustering indices. In this study, statistical indices were taken to calculate the number of clusters. Simultaneously, seed points were found out based on hierarchical clustering. These statistical approaches give information about features of clusters, so it can reduce computing cost and increase accuracy of clustering. The proposed algorithm can play an important role in datamining and knowledge discovery.
Keywords
Coagulant control; rule extraction; datamining; rule-based control;
Citations & Related Records
연도 인용수 순위
  • Reference
1 T. J. Knight, D. W. Greve, X. Cheng and B. H. Krogh, 'Real-time multivariable control of PECVD silicon nitride film properties,' IEEE Transaction on Semiconductor Manufacture, Vol.10, No.1, pp.137-145, February, 1997   DOI   ScienceOn
2 Sang Jeen Hong and Gary S. May, 'Neural Network-Based Real-Time Malfunction Diagnosis of Reactive Ion Etching Using In Situ Metrology Data,' IEEE Transactions on semiconductor manufacturing, VOL. 17, NO.3, AUGUST 2004
3 Michael D. Baker, Christopher, Himmel, and Gary S. May 'Time Series Modeling of Reactive Ion Etching Using Neural Network,' IEEE Transactions on Semiconductor Manufacturing, Vol.8, No.1, pp.62-71, Feb 199 [5]   DOI   ScienceOn
4 Sylvie Bosch-charenay, Jiazhan Xu, John Haigis, Peter A. Resenthal, Peter Solomon, and James M. Bustillo, 'Real-time etch-depth measurements of MEMS devices,' Journal of Microelectromechanical systems, Vol.110, No.2, pp.111-117, April, 2002
5 김 대수, '신경망 이론과 응용(I)', 하이테크정보, 1993
6 P. J. O'Sulivan, J. Martinez, J. Durham and S. Felker, 'Using UPM for real-time multivariate modeling of semiconductor manufacturing equipment,' SEMATECH APC/AEC Workshop VII, New Oeleans, Louisiana, pp.5-8, November, 1995
7 T.L Vincent, P.P. Khargonekar and F. L. Terry, Jr., 'An extended Kalman filtering-based method of processing reflectometry data for fast In-Situ Rate Measurements,' IEEE Transaction on Semiconductor Manufacture, Vol.10, No.1, pp.137-145, February, 1997   DOI   ScienceOn
8 Chein-I Chang and Qian Du, 'Interference and Noise-Adjusted Principal Components Analysis,' IEEE Transactions on geodcience and remote sensing, VOL. 37, NO. 5, SEPTEMBER 1999