1 |
Zahir Parpia and C. A. T. Salama, 'Optimization of RESURF LDMOS Transistors: An Analytical Approach,' IEEE Trans. Electron Devices, vol. 37, no. 3, 1990
|
2 |
Taylor Efland, Peter Mei, Dan Mosher, Bob Todd, 'Self-Aligned RESURF To LOCOS Region LDMOS Characterization shows Excellent Rsp vs BV Performance,' Power Semiconductor Devices and ICs, 1996. ISPSD '96 Proceedings., 8th International Symposium on, 20-23 May 1996
|
3 |
E. C. Griffith, J. A. Power, S. C. Kelly, P. Elebert, S. Whiston, D. Bain, and M. O'Neill, 'Characterization and Modeling of LDMOS Transistors on a 0.6um CMOS Technology,' Proceedings of the 2000 International Conference, March 2000
|
4 |
M. Shindo, M. Morikawa, T. Fujioka, K. Nagura, K. Kurotani, K. Odaira, T. Uchiyama, I. Yoshida, 'High Power LDMOS for Cellular Base Station Applications,' Proceedings of 2001 International Symposium on Power Senuconductor Devices & IC's, 2001
|
5 |
오동주, 염기수, '내부 전계 링을 갖는 LDMOS의 해석적 항복전압 모델,' 한국해양정보통신학회 추계종합학술대회, vol. 7, no. 2, 2003
|
6 |
Zia Hossain, Mohamed Imam, Joe Fulton, Masami Tanaka, 'Double-resurf 700V N-channel LDMOS with Best-in-class On-resistance,' Power Semiconductor Devices and ICs, 2002. Proceedings of the 14th International Symposium on, 4-7 June 2002
|
7 |
Jorgen Olsson, Niklas Rorsman, LarsVestling, Christian Fager, Johan Ankarcrona, Herbert Zirath, Klas-Hakan Eklund, '1 W/mm RF Power Density at 3.2GHz for a Dual-Layer RESURF LDMOS Transistor', IEEE Trans. Electron Devices, vol. 23, no. 4, 2002
|
8 |
A. Nezar and C. A. T. Salama, 'Breakdown Voltage in LDMOS Transistors Using Internal Field Rings,' IEEE Trans. Electron Devices, vol. 38, no. 7, 1991
|
9 |
Jongdae Kim, Sang-Gi Kim, Q. Sang Song, Sang Yong Lee, Jin-Gun Koo, and Dong Sung Ma, 'Improvement on P-charmel SOILDMOS Transistor by Adapting a New Tapered Oxide Technique,' IEEE Trans. Electron Devices, vol. 46, no. 9, 1999
|
10 |
Shengdong Zhang, Johnny K. 0. Sin, Tommy M. L. Lai, Ping K. Ko, 'Numerical Modeling of Linear Doping Profiles for High-Voltage Thin-Film SOI Devices,' IEEE Trans, Electron Devices, vol. 46, no. 5, 1999
|