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Characteristics of ZnO Films Deposited on Plastic Substrates by Using Various RF Sputtering Powers  

Kim, J.J. (Department of Nano Semiconductors, Korea Maritime University)
Park, J.Y. (Department of Nano Semiconductors, Korea Maritime University)
Kim, H.S. (Department of Nano Semiconductors, Korea Maritime University)
Lee, W.J. (Department of Nano Engineering, Dong Eui University)
Cho, C.R. (Department of Nano Medical Engineering, Pusan National University)
Publication Information
New Physics: Sae Mulli / v.58, no.4, 2009 , pp. 471-476 More about this Journal
Abstract
Zinc oxide (ZnO) films were deposited on polycarbonate (PC) and polyethersulfone (PES) substrates by RF sputtering at room temperature. The effects of sputtering power in the range from 100 W to 200 W on the structural and the optical properties of the ZnO films on the plastic substrates were investigated. Regardless of the substrate type, the X-ray diffraction (XRD) measurements revealed that all of the ZnO films on plastic substrates had a (002) preferred orientation associated with the hexagonal phase. While the best ZnO film with respect to structural properties was obtained for a sputtering power of 175 W, the ZnO films deposited around 100 W showed stable optical transmittances over 85% in the visible range. The ZnO films deposited on PES substrates were better than those deposited on PC substrates with respect to both the structural and optical properties.
Keywords
ZnO; PC; PES; Sputtering power;
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