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http://dx.doi.org/10.17663/JWR.2011.13.3.697

The Antibiotic Resistant Gene Pollutant Controls using Chlorine or Ozone disinfection  

Kim, Sung-Pyo (고려대학교 환경시스템공학과)
Rhu, Dae-Whan (부강테크)
Oh, Jun-Sik (고려대학교 환경시스템공학과)
Cho, Yun-Chul (대전대학교 환경공학과)
Publication Information
Journal of Wetlands Research / v.13, no.3, 2011 , pp. 697-705 More about this Journal
Abstract
The aim of this study was to examine ozonation disinfection efficiency for Escherichia coli DH5alpha removal, containing the multi-resistance plasmid pB10 as well as chlorination disinfection efficiency. In addition, plasmid pB10 removal rates were estimated by ozonation and chlorination. The removal efficiency of pB10 via ozonation was about 2 to 4 times higher than chlorination. High removal efficiency of pB10 is likely due to OH radical produced during ozonation. These results suggest that integration of advanced oxidation process such as ozonation (or photocatalytic oxidation) with conventional disinfection such as chlorination may be needed for effective control of antibiotic resistant bacteria and genetic materials.
Keywords
Chlorination; Escherichia coli DH 5 alpha(E.coli $DH5{\alpha}$); OH Radical; Ozonation; pB10;
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