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http://dx.doi.org/10.4218/etrij.17.0116.0004

Design Method of Tunable Pixel with Phase-Change Material for Diffractive Optical Elements  

Lee, Seung-Yeol (School of Electronics Engineering, Kyungpook National University)
Kim, Han Na (ICT Material & Components Research Laboratory, ETRI)
Kim, Yong Hae (ICT Material & Components Research Laboratory, ETRI)
Kim, Tae-Youb (ICT Material & Components Research Laboratory, ETRI)
Cho, Seong-Mok (ICT Material & Components Research Laboratory, ETRI)
Kang, Han Byeol (ICT Material & Components Research Laboratory, ETRI)
Hwang, Chi-Sun (ICT Material & Components Research Laboratory, ETRI)
Publication Information
ETRI Journal / v.39, no.3, 2017 , pp. 390-397 More about this Journal
Abstract
In this paper, we propose a scheme for designing a tunable pixel layer based on a $Ge_2Sb_2Te_5$ (GST) alloy thin film. We show that the phase change of GST can significantly affect the reflection characteristic when the GST film is embedded into a dielectric encapsulation layer. We investigate the appropriate positions of the GST film within the dielectric layer for high diffraction efficiency, and we prove that they are antinodes of Fabry-Perot resonance inside the dielectric layer. Using the proposed scheme, we can increase the diffraction efficiency by about ten times compared to a bare GST film pixel, and 80 times for the first-to-zeroth-order diffraction power ratio. We show that the proposed scheme can be designed alternatively for a broadband or wavelength-selective type by tuning the dielectric thickness, and we discuss a multi-phase example with a double-stack structure.
Keywords
Diffraction gratings; $Ge_2Sb_2Te_5$; Phase-Change material; Fabry-Perot resonance; Spatial light modulator;
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