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http://dx.doi.org/10.12673/jant.2018.22.2.123

Design and Fabrication of a Dual Linear Polarization Sinuous Antenna with Improved Cross Polarization Isolation  

Kim, Jee-heung (Agency for Defense Development)
Ryu, Hong-kyun (Agency for Defense Development)
Chae, Myung-ho (Agency for Defense Development)
Kim, Jung-hoon (Agency for Defense Development)
Park, Beom-jun (Agency for Defense Development)
Park, Young-ju (Agency for Defense Development)
Abstract
In this paper, we design and fabricate a dual liner polarization sinuous antenna with improved cross polarization isolation (XPI). The proposed antenna is composed of four arm radiators for generating dual linear polarization and excited by wideband microstrip balun with Klopfenstein taper structure. Also, two-step cylindrical cavity structure is applied to reduce back radiation. Honeycomb-typed absorbing material is inserted into the cavity to reduce performance degradation by reflected wave. To enhance cross polarization isolation in low frequency band, resistors are adapted between outer arm and the rim of cavity. We confirmed that the fabricated antenna can be applied for polarization measurement due to improved XPI in the low band.
Keywords
Sinuous antenna; Cavity-back antenna; two-step cylindrical cavity; Cross polarization isolation (XPI); Dual linear polarization;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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