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http://dx.doi.org/10.9713/kcer.2021.59.2.254

Optical and Electrical Characteristics of Fluorocarbon Films Deposited in a High-Density C4F8 Plasma  

Kwon, Hyeokkyu (Department of Chemical Engineering and Department of Energy Systems Research, Ajou University)
You, Sanghyun (Department of Chemical Engineering and Department of Energy Systems Research, Ajou University)
Kim, Jun-Hyun (School of Chemical Engineering, SungKyunKwan University)
Kim, Chang-Koo (Department of Chemical Engineering and Department of Energy Systems Research, Ajou University)
Publication Information
Korean Chemical Engineering Research / v.59, no.2, 2021 , pp. 254-259 More about this Journal
Abstract
Optical and electrical characteristics of the fluorocarbon films deposited in a high-density C4F8 plasma under various source powers and pressures were investigated. The F/C ratio of the fluorocarbon film deposited in a high-density C4F8 plasma increased with increasing source power and decreasing pressure due to two-step deposition mechanism. The change in the F/C ratio of the film directly affected the optical and electrical characteristics of the fluorocarbon films deposited in a high-density C4F8 plasma. The refractive index of the fluorocarbon film increased with decreasing source power and increasing pressure contrary to the dependence of the film's F/C ratio on the source power and pressure. This was because the increase in the F/C ratio suppressed electronic polarization and weakened the network structures of the film. The resistivity of the fluorocarbon film showed the same behavior as its F/C ratio. In other words, the resistivity increased with increasing source power and decreasing pressure, resulting from stronger repellence of electrons at higher F/C ratios. This work offers the feasibility of the use of the fluorocarbon films deposited in a high-density C4F8 plasma as an alternative to low dielectric constant materials because the optical and electrical properties of the fluorocarbon film can be directly controlled by its F/C ratio.
Keywords
Fluorocarbon film; High-density plasma; F/C ratio; Refractive index; Resistivity;
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