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Kim, J.-H., Cho, S.-W. and Kim, C.-K., "Angular Dependence of Si3N4 Etching in C4F6/CH2F2/O2/Ar Plasmas," Chem. Eng. Technol., 40, 2251-2256(2017).
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Yang, G. H., Oh, S. W., Kang, E. T. and Neoh, K. G., "Plasma Polymerization and Deposition of Linear, Cyclic and Aromatic Fluorocarbons on (100)-Oriented Single Crystal Silicon Substrates," J. Vac. Sci. Technol. A, 20, 1955-1963(2002).
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Shirafuji, T., Nishimura, Y. and Tachibana, K., "Plasma Polymerization of Fluorocarbon Thin Films on High Temperature Substrate and Its Application to Low-k Film," Thin Solid Films, 515, 4111-4115(2007).
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Valentini, L., Braca, E., Kenny, J. M., Lozzi, L. and Santucci, S., "Fluorinated Amorphous Carbon Thin Films: Analysis of the Role of the Plasma Source Frequency on the Structural and Optical Properties," J. Vac. Sci. Technol. A, 19, 2168-2173(2001).
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Han, L. M., Timmons, R. B. and Lee, W. W., "Pulsed Plasma Polymerization of an Aromatic Perfluorocarbon Monomer: Formation of Low Dielectric Constant, High Thermal Stability Films," J. Vac. Sci. Technol. B, 18, 799-804(2000).
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