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http://dx.doi.org/10.9713/kcer.2012.50.2.204

Preparation of Nickel Oxide Films by Anodizing  

Kim, Youngjin (Department of Chemical Engineering, Kyonggi University)
Jung, Jihoon (Department of Chemical Engineering, Kyonggi University)
Publication Information
Korean Chemical Engineering Research / v.50, no.2, 2012 , pp. 204-210 More about this Journal
Abstract
Nickel oxide thin films with 2.3 ${\mu}m$ thickness were prepared in order to overcome limitations of thickness with nm dimension by anodizing. For the electrolyte, ethylene glycol was used as solvent, and $NH_4F$ was added for source of $F^-$ ions. The anodizing experiments were carried out on various voltages such as 40, 60 V and 80 V for 12 hours. The thickness of NiO was changed according to the anodizing time and the voltage. However, destruction of Ni caused by rapid oxidation reaction occurred at 80 V. XRD results show that NiO was successfully created by anodizing.
Keywords
Nickel; Nickel Oxide; Anodizing; Thin Film;
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Times Cited By KSCI : 3  (Citation Analysis)
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