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http://dx.doi.org/10.9713/kcer.2011.49.2.195

Characteristics of Mo Thin Films Deposited by DC Magnetron Sputtering  

Kong, Seon-Mi (Department of Chemical Engineering, Inha University)
Xiao, Yubin (Department of Chemical Engineering, Inha University)
Kim, Eun-Ho (Department of Chemical Engineering, Inha University)
Chung, Chee-Won (Department of Chemical Engineering, Inha University)
Publication Information
Korean Chemical Engineering Research / v.49, no.2, 2011 , pp. 195-199 More about this Journal
Abstract
Mo thin films were deposited on soda lime glass at room temperature by using DC magnetron sputtering The electrical and structural properties of the films were investigated by varying DC power and gas pressure as the deposition parameter. As DC power increased, the deposition rate of Mo films was increased and the electrical resistivity was decreased. It was observable that the crystallinity of the films was improved with increasing DC power. As gas pressure decreased, the deposition rate and resistivity of the films were decreased, and long rectangular grains were densely formed. With increasing gas pressure, the grains were transformed to a round shape and the voids on the film surface were increased. It was confirmed that the electrical resistivity of Mo films was increased as the amount of oxygen combined with Mo atoms increased. It was also disclosed that the films have low resistivity as the degree of coupling of oxygen with Mo was reduced due to the enhancement of the crystallinity of the films.
Keywords
Molybdenum Thin Film; DC Magnetron Sputtering; Back Contact Electrode; CIGS Solar Cells;
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