Effect of Fe(ClO4)3 Addition in the Aqueous Ferric Chloride Etchant on the Increase of Shadow Mask Etch Rate
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Kim, Young Wook
(School of Display and Chemical Engineering, Yeungnam University)
Park, Mooryong (LG Innotek, Co., Ltd.) Lee, Hyung Min (School of Display and Chemical Engineering, Yeungnam University) Park, Gwang Ho (LG Innotek, Co., Ltd.) Park, Chinho (School of Display and Chemical Engineering, Yeungnam University) |
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