Browse > Article

Characteristics of Transparent Conductive Tin Oxide Thin Films on PET Substrate Prepared by ECR-MOCVD  

Kim, Yun Seok (Department of Chemical Engineering, Hongik University)
Jeon, Bup Ju (Eco-Nano Technology Research Center, Korea Institute of Science and Technology)
Ju, Jeh Beck (Department of Chemical Engineering, Hongik University)
Sohn, Tae Won (Department of Chemical Engineering, Hongik University)
Lee, Joong Kee (Eco-Nano Technology Research Center, Korea Institute of Science and Technology)
Publication Information
Korean Chemical Engineering Research / v.43, no.1, 2005 , pp. 85-91 More about this Journal
Abstract
$SnO_2$ films were prepared at room temperature under a $(CH_3)_4Sn-H_2-O_2$ atmosphere in order to obtain transparent conductive polymer by using ECR-MOCVD (Electron Cyclotron resonance -Metal Organic Chemical Vapor Deposition) system. The electrical properties of the films were investigated as function of process parameters such as deposition time, microwave power, magnetic current power, magnet/showering/substrate distance and working pressure. An increase in microwave power and magnetic current power brought on $SnO_2$ film formation with low electric resistivity. On the other hand, the effects of process parameters described above on optical properties were insignificant in the range of our experimental scope. The transmittance and reflectance of the films prepared by the ECR-MOCVD exhibited their average values of 93-98% at wave length range of 380-780 nm and 0.1-0.5%, respectively. The grain size of the $SnO_2$ films that are also insensitive with the process parameters were in the range of 20-50 nm. On the basis of experimental data obtained in the present study, electrical resistivity of $7.5{\times}10^{-3}ohm{\cdot}cm$, transmittance of 93%, and reflectance of 0.2% can be taken as optimum values.
Keywords
Tin Oxide; PET; ECR-MOCVD; Transmittance; Resistivity;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 Radha Krishna, B., Subramanyam, T. K., Srinivasulu Naidu, B. and Uthanna, S., 'Effect of Substrate Temperature on the Electrical and Optical Properties of dc Reactive Magnetron Sputtered Indium Oxide Films,' Optical Materials, 15(3), 217-224(2000)   DOI   ScienceOn
2 Jeong, W.-J., Kim, S.-K., Kim, J.-U., Park, G.-C. and Gu, H.-B., 'Properties of Indium Tin Oxide Transparent Conductive Thin Films at Various Substrate and Annealing Temperature,' Tran. Elec. Electronic Materials, 3(1), 18-22(2002)   DOI
3 Ataev, B. M., Mamedov, V. V., Omaev, A. K. and Magomedov, B. A., 'Epitaxial ZnO Films Grown by RF-Assisted Low-Temperature CVD Method,' Materials Science in Semiconductor Processing, 6(5-6), 535-537(2003)   DOI   ScienceOn
4 Water, W. and Chu, S.-Y., 'Physical and Structural Properties of ZnO Sputtered Films,' Materials Letters, 55(1-2), 67-72(2002)   DOI   ScienceOn
5 Yusta, F. J., Hitchman, M. L. and Shamlian, H., 'CVD Preparation and Characterization of tin Dioxide Films for Electrochemical Application,' J. Mater. Chem, 7(8), 1421-1427(1997)   DOI   ScienceOn
6 Hyun, J., Jeon, B. J., Byun, D. and Lee, J. K., 'Effect of Process Parameters on the Adhesion of Copper Film on Polyethylene Tetrephthalate (PET) Substrate Prepared by ECRMOCVD Coupled with a Periodic DC Bias,' Mat. Res. Soc. Symp. Proc., 795, U8.5.1-6(2004)
7 Deschamps, F. L., 'Recent Development Results in Color-Plasma Display,' SID, 315-318(1994)
8 Robbins, J. J., Alexander, R. T., Xiao, W., Vincent, T. L. and Wolden, C. A., 'An Investigation of Tin Oxide Plasma-Enhanced Chemical Vapor Deposition using Optical Emission Spectroscopy,' Thin Solid Films, 406, 145-150(2002)   DOI   ScienceOn
9 Jeon, B. J. and Lee, J. K., 'Preparation and Characterization of Copper Film on Plastic Substrate by ECR-MOCVD Coupled with a DC Bias,' Mat. Res. Soc. Symp. Proc., 812, F3.23.1-6(2004)
10 Chow, T. P., Chezzo, M. and Baliga, B. J., 'Antimony-Doped tin Oxide Films Deposited by the Oxidation of Tetramethyltin and Trimethylantimony,' J. Electrochem. Soc, 129(5), 1041-1045(1982)
11 Shanthi, E., Dutta, V., Banerjee, A. and Chopra, K. L., 'Electrical and Optical Properties of Undoped and Antimony Doped with F and (Sb+F),' J. Appl. Phys., 53(3), 1612-1615(1982)
12 Shanthi, E., Dutta, V., Banerjee, A. and Chopra, K. L., 'Electrical and Optical Properties of Undoped and Antimony Doped Tin Oxide Films Doped Tin Oxide Films,' J. Appl. Phys., 51(12), 6243-6251(1980)   DOI   ScienceOn
13 Wu, W.-F., Chiou, B.-S. and Hsieh, S.-T., 'Effect of Sputtering Power on the Structural and Optical Properties of RF Magnetron Sputtered ITO Fimls,' Semicond. Sci. Technol, 9(6), 1242-1249(1994)   DOI   ScienceOn
14 Vessen, J. L., 'Physics of Thin Films,' (Georg Hass, ed.) Academic Press. New York, 9, 1-71(1981)
15 Girtan, M., Rusu, G. I. and Rusu, G. G., 'The Iinfluence of Preparation Conditions on the Electrical and Optical Properties of oXidized Indium Thin Films,' Materials Science and Engineering, B76(2), 156-160(2000)
16 Dolbec, R., El Khakani, M. A., Serventi, A. M. and Saint jacques, R. G., 'Influence of the Nanostructural Characteristics on the Gas Sensing Properties of Pulsed Laser Deposited Tin Oxide Thin Films,' Sensors and Actuators B: Chemical, 93(1-3), 566-571(2003)   DOI   ScienceOn