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Enhancement in the Amine Resistance of Membranes for Membrane Contactors by Plasma Treatment  

Choi, Seung-Hak (Department of Chemical Engineering, Sun-Moon University)
Oh, Sae-Joong (Department of Chemical Engineering, Sun-Moon University)
Cho, Nam-Joon (Department of Applied Chemical Engineering, Korea University of Technology and Education)
Koo, Ja-Kyung (Department of Applied Chemical Engineering, Korea University of Technology and Education)
Publication Information
Korean Chemical Engineering Research / v.40, no.6, 2002 , pp. 719-724 More about this Journal
Abstract
Celgard and Durapore membranes were plasma-treated to enhance the hydrophobicity and durability to amine solution. The plasma gases or vapors used were $CF_4$, Hexafluorobenzene(HFP), Pentafluoropyridine(PFP) and Hexamethyldisiloxane(HMDS). The surface structure of plasma treated membranes was analyzed by FT-IR spectra. The contact angles of plasma treated Celgard and Durapore were dependent of the plasma gases used. $CF_4$ and HMDS plasma increased the contact angles of Celgard and Durapore, while HFB and PFP plasma decreased the contact angles. Durability to monoethanolamine(MEA) solution was enhanced for $CF_4$ plasma-treated Durapore, while the durability was not good for plasma-treated Celgard.
Keywords
Plasma Treatment; Contact angle; Hydrophobicity; Resistance;
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