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http://dx.doi.org/10.12925/jkocs.2007.24.3.13

Synthesis of novolac resins by condensation of phenolic compounds with formaldehyde  

Lee, Jong-Dae (Department of Chemical Engineering, Chungbuk National University)
Lee, Tae-Jun (Department of Chemical Engineering, Chungbuk National University)
Lee, Chang-Hoon (Department of Chemical Engineering, Hanyang University)
Cho, Kyung-Tae (Department of Chemical Engineering, Chungbuk National University)
Publication Information
Journal of the Korean Applied Science and Technology / v.24, no.3, 2007 , pp. 309-318 More about this Journal
Abstract
Novolac is widely used as the primary solid component of most photoresists in semiconductor and microelectronic devices. In this study, novolac resins were prepared by condensation of 35% formaldehyde with phenolic compounds such as m-/p-cresol, 2,5-dimethylphenol and bisphenol A in the presence of oxalic acid as catalyst. The average molecular weight $(M_w)$ of these novolac resins has been varied on the changing of mixing ratio of m-/p-cresol/2,5-dimethylphenol/bisphenol A or formaldehyde/phenolic compound. Also, thermal properties of novolac were observed by TGA.
Keywords
novolac; formaldehyde; 2,5-dimethylphenol; bisphenol A; photoresist;
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