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http://dx.doi.org/10.1080/15980316.2011.569168

Split sputter mode: a novel sputtering method for flat-panel display manufacturing  

Pieralisi, Fabio (Applied Materials GmbH & Co. KG)
Hanika, Markus (Applied Materials GmbH & Co. KG)
Scheer, Evelyn (Applied Materials GmbH & Co. KG)
Bender, Marcus (Applied Materials GmbH & Co. KG)
Publication Information
Abstract
Advanced static DC magnetron sputtering methods based on the magnet wobbling technique were investigated to achieve highly uniform and homogeneous metallization layers. The novel split sputter mode (SSM) method, wherein the deposition process is divided into two distinct steps, enables the AKT rotary cathode technology to provide excellent layer properties, while keeping a high production throughput. The effectiveness of theSSMtechnique was demonstrated through copper-coated large-area substrates.
Keywords
static DC magnetron sputtering; rotary cathode array; rotating magnets;
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