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Development of POS446M & POS430 Ti Flatron Rail Manufacturing Process for Practical Use  

Chun, Hyun-Tae (Device Research Laboratory, LG. Philips Displays)
Koh, Nam-Je (Device Research Laboratory, LG. Philips Displays)
Han, Soo-Deok (Device Research Laboratory, LG. Philips Displays)
Park, No-Jin (Deepartment of Materials Science & Engineering. Kumoh National University of Technology)
Oh, Myung-Hoon (Deepartment of Materials Science & Engineering. Kumoh National University of Technology)
Publication Information
Abstract
POS446M and POS430Ti alloys were investigated for application to a Flatron rail instead of conventional 28 wt%Cr alloy in order to reduce material costs. It was found that the permeability decrement of materials could be successfully minimized by proper heat treatment, and that the beam landing drift of the Flatron was not overly affected by the permeability of materials. In addition, the Flatron manufacturing process using POS430Ti was also stabilized without glass cracking by the application of the modified process conditions, which were optimized through the design of the experiment method.
Keywords
Flatron rail; POS 446M; POS430Ti; landing drift; glass crack;
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