Browse > Article
http://dx.doi.org/10.3365/KJMM.2012.50.7.545

Characteristics of ITO Films Grown on an Oxygen Plasma Treated Glass Substrate  

Chae, Hong-Chol (Department of Advanced Materials Engineering, Chungbuk National University)
Hong, Joo-Wha (Department of Advanced Materials Engineering, Chungbuk National University)
Publication Information
Korean Journal of Metals and Materials / v.50, no.7, 2012 , pp. 545-548 More about this Journal
Abstract
The optical and electronic properties of Indium Tin Oxide (ITO) thin films deposited on a RF-plasma treated glass substrate were investigated by X-Ray Photoelectron Spectroscopy (XPS), Ultra-violet Photoelectron Spectroscopy (UPS), Reflected Electron Energy Loss Spectroscopy (REELS). The modification of glass substrates was carried out by varying the time of the plasma surface treatment in an oxygen atmosphere. The focus of this research was to examine how the optical and electronic properties of ITO thin films change with the plasma treatment time. The surface energy increased since the carbon bonds were removed from the surface after the glass substrate received the surface treatment. The ITO thin films produced on the glass substrate with surface treatment showed that the high optical transmittance was approximately 85%. The measured band gap energy was as high as 3.23 eV when the plasma treatment time was 60 s and the work function after the treatment was increased by 0.5 eV in comparison to that before the treatment of 60 s. The ITO thin film exhibited an excellent sheet resistance of $2.79{\Omega}/{\Box}$. We found that the optical and electronic properties of ITO thin films can be improved by RF-plasma surface treatment.
Keywords
surface modification; ITO; REELS; UPS; XPS;
Citations & Related Records
연도 인용수 순위
  • Reference
1 T. Nakada, Y. Hirabayashi, T. Tokado, D. Ohmori, and T. Mise, Solar Energy 77, 739 (2004).   DOI   ScienceOn
2 Y. S. Kim, H. E. Lim, S. H. Han, Y. H. Lee, and Y. S. Kim, Analytical Science & Technology, 15, 229 (2002).
3 H. So, D. J. Yim, and Y. C. Kim, Hwahak Konghak 41, 80 (2003).
4 J. Gielen, M. Sanden, and D. Schram, Thin Solid Films 271, 56 (1995).   DOI   ScienceOn
5 P. K. Son, S. W. Choi, and S. S. Kim, Nanoscale Research Letters 7, 118 (2012).   DOI   ScienceOn
6 Y. S. Jung, W. J. Kim, H. W. Choi, Y. S. Park, and K. H. Kim, Thin Solid Films 519, 6844 (2011).   DOI   ScienceOn
7 S. H. Kim, D. J. Choi, J. S. Lee, and H. S. Choi, Polymer(Korea) 33, 263 (2009).
8 H. C. Chae, C. H. Baeg, and J. W. Hong, Korean J. Met. Mater 49, 192 (2011).
9 L. Chkoda, C. Heske, M. Sokolowski. E. Umbach. F. Steuber, J. Staudigel, M. Stobel, and J. Simmerer, Synthetic Metals 111, 315 (2000).