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Optically Transparent ITO Film and the Fabrication of Plasma Signboard  

Jo, Young Je (Department of Materials Science and Metallurgical Engineering, Sunchon National University)
Kim, Jae-Kwan (Department of Materials Science and Metallurgical Engineering, Sunchon National University)
Han, Seung-Cheol (Department of Materials Science and Metallurgical Engineering, Sunchon National University)
Kwak, Joon-Seop (Department of Materials Science and Metallurgical Engineering, Sunchon National University)
Lee, Ji-Myon (Department of Materials Science and Metallurgical Engineering, Sunchon National University)
Publication Information
Korean Journal of Metals and Materials / v.47, no.1, 2009 , pp. 44-49 More about this Journal
Abstract
Indium tin oxide(ITO) thin films were deposited on the glass substrates by radio-frequency (RF) magnetron sputtering method. The influence of rapid thermal annealing (RTA) treatment on the optical and electrical properties of the films were investigated for the purpose of fabricating plasma display signboard. Structural properties, surface roughness, sheet resistance and transmittance of the ITO film were analysed by using x-ray diffraction method, atomic force microscopy (AFM), four point prove, and ultraviolet-visible spectrometer, respectively. It was found that the RTA treatment increased the transmittance and decreased the resistivity of the ITO film, respectively. Furthermore, we successfully demonstrated the direct-current plasma signboard by using ITO electrode and phosphors.
Keywords
ITO; TCO; plasma signboard;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
Times Cited By Web Of Science : 5  (Related Records In Web of Science)
Times Cited By SCOPUS : 6
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