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http://dx.doi.org/10.7842/kigas.2014.18.5.1

A Study on the Estimation of Damage by Leaking of NH3 and Cl2 applied to LPCVD  

Huh, Yong-Jeong (Gas Appliances Division, Korea Gas Safety Corporation)
Leem, Sa-Hwan (School of Mechatronics, Korea University of Technology and Education)
Publication Information
Journal of the Korean Institute of Gas / v.18, no.5, 2014 , pp. 1-5 More about this Journal
Abstract
As high-tech science has developed, the need of semiconductor is required constantly. However, there are many processes which use a great deal of poisonous gas in the semiconductor process, so the dangerousness by a gas leak is latent in these processes. Especially, the accident of toxic gas is almost made by ammonia and chlorine. Therefore this report estimates the damage by the leak of ammonia and chlorine used in LPCVD system.
Keywords
LPCVD; $NH_3$; $Cl_2$; Leakage; Estimation of damage;
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