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http://dx.doi.org/10.7842/kigas.2011.15.3.074

Study for an BF3 Specialty Gas Production  

Lee, Taeck-Hong (Department of Chemical Engineering, Hoseo University)
Kim, Jae-Young (Department of Chemical Engineering, Hoseo University)
Publication Information
Journal of the Korean Institute of Gas / v.15, no.3, 2011 , pp. 74-78 More about this Journal
Abstract
$BF_3$ gas has been used for semiconductor manufacturing process and applied in plasma etching, chemical vapor deposition, chamber cleaning processes etc,. $BF_3$ provides Boron and acts as a p-type doping in electrode in semiconductor. In this study, we investigate thermaldecomposition of alkali-boron complexes and suggest a simple way to produce $BF_3$ from $NaBF_4$ and $KBF_4$.
Keywords
boron trifluoride; thermal decomposition; semiconductor gas; toxic gas; boron;
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