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http://dx.doi.org/10.14478/ace.2016.1005

Non-HF Type Etching Solution for Slimming of Flat Panel Display Glass  

Lee, Chul-Tae (Department of Chemical Engineering, Dankook University)
Publication Information
Applied Chemistry for Engineering / v.27, no.1, 2016 , pp. 101-109 More about this Journal
Abstract
The purpose of this research was to develop a flat panel display device's glass etchant which can replace hydrofluoric acid. The glass etchant was composed of 18~19% wt% of ammonium hydrogen fluoride, 24~25 wt% of sulfuric acid, 45~46 wt% of water, 4~5 wt% of sulfate and 7~8 wt% of fluoro-silicate. By replenishing the etchant which has the amount of 5% of initial solution's mass, it was possible to reuse the etchant continuously. The developed etchant showed $5{\mu}m/min$ of etching rate at $30^{\circ}C$. The reusable etchant, with replenishing 5% of initial etchant mass showed the stable etching rate, which has the deviation of less than $0.1{\mu}m/min$ etching rate. The glass surface of flat panel display device created from our etching process was in good condition with any defects such as pin hole and dimple.
Keywords
non-hydrogen fluoride; etching; glass slimming; flat pannel disply;
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