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Decomposition of Chlorinated Methane by Thermal Plasma  

Kim, Zhen Shu (Department of Chemical Engineering/RIC for Environmental Technology of Thermal plasma, Inha University)
Park, Dong Wha (Department of Chemical Engineering/RIC for Environmental Technology of Thermal plasma, Inha University)
Publication Information
Applied Chemistry for Engineering / v.18, no.2, 2007 , pp. 136-141 More about this Journal
Abstract
The decomposition of chlorinated methanes including $CCl_4$, $CCl_3H$, and $CCl_2H_2$ was carried out using a thermal plasma process and the characteristics of the process were investigated. The thermal equilibrium composition was analyzed with temperature by Fcatsage program. The decomposition rates at various process parameters including the concentration of reactants, flow rate of carrier gas, and quenching rate, were evaluated, where sufficiently high conversion over 92% was achieved. The generation of main products was strongly influenced by the reaction atmosphere; carbon, chlorine, and hydrogen chloride at neutral condition; carbon dioxide, chlorine, and hydrogen chloride at oxidative condition. The decomposition mechanism was speculated considering the results from Factsage and the identification of generated radicals and ionic species. The main decomposition pathways were found to be dissociative electron attachment and oxidative by radicals formed in a plasma state.
Keywords
thermal plasma; decomposition; chlorinated methane;
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