1 |
P. Preikschat and R. Jansen, Galvanotechnik, Jahrg., 54, 49 (2000)
|
2 |
P. Hulser, AESF Continuous Steel Strip Sympsium, 7-8 May (2002)
|
3 |
R.A. Chalmers, in Comprehensive Analytical Chemistry, 10, 581, Elservier, Amsterdam (1962)
|
4 |
G. Boef and B. S. Poeder, Anal. Chim. Acta, 30, 261 (1964)
DOI
ScienceOn
|
5 |
P. Cazeneuve, Compt. Rend., 131, 346 (1960)
|
6 |
N. M. Cullinane and S. J. Chard, Analyst, 73, 95 (1948)
DOI
|
7 |
D. T. Burns, A. Townshend, and A. G. Catchpole, Inorganic Reaction Chemistry:Systematic Chemical Separation, 238, Horwood, chichester (1980)
|
8 |
C. T. Lee, J. Korean Ind. Chem., 12, 831 (2001)
|
9 |
M. R. Verma, V. M. Bhuchar, and K. C. Agrawall, Microchim., Acta, 766 (1959)
|
10 |
P. Koenig and Chem. Zeit., 35, 277 (1911)
|
11 |
N. M. Martyak, Surf. Coat. Technol., 88, 1 (1997)
DOI
|
12 |
P. Hulser, International MKS-specialistconference, 4-5 Nov. (1999)
|
13 |
R. Pribil, Z. Roubal, and E. Svatek, Collect. Czech. Chem. Commun., 18, 43 (1953)
|
14 |
P. Wenger and R. Duckert, Helv. Chem. Acta, 27, 1839 (1944)
DOI
|
15 |
ねじの世界 10 (2002)
|
16 |
J. R. Waldrop and M. W. Kendig, J. Electrochem. Soc., 145 (1998)
|
17 |
M. P. Nascimento, R. C. Souza, I. M. Miguel, W. L. Pigatin, and H. J. C. Voorwald, Surf. Coat. Technol., 138, 113 (2001)
DOI
|
18 |
W. R. McGovern, P. Schmutz, R. G. Buchheit, and R. L. McCreery, J. Electrochem. Soc., 147, 4494 (2000)
DOI
ScienceOn
|
19 |
W. H. Hartford, Chromium, in Treatise on Analytical Chemistry, I. M. Kolthoff and P. J. Elving, eds, Part II, 8, Interscience, NY (1963)
|
20 |
P. Campestrini, E. P. M. van Westing, and J. H. W. de Wit, Electrochim. Acta, 46, 2631 (2001)
DOI
ScienceOn
|
21 |
F. Buscarons and I. Artigas, Anal. Chim. Acta, 16, 452 (1957)
DOI
|
22 |
R. T. Pflaum and L. C. Howick, J. Am. Chem. Soc., 78, 4862 (1956)
DOI
|
23 |
M. Perucki and P. Chandrasekhar, Synth. Met., 119, 385 (2001)
DOI
|
24 |
K. Shimizu, G. M. Brown, K. Kobayashi, P. Skeldon, G. E. Thompson, and G. C. Wood, Corros. Sci., 40, (1998)
|
25 |
J. E. Earley and R. D. Cannon, Transition Met. Chem., 1, 33 (1965)
|
26 |
Z. H. Zhao, S. Eguchi, Y. Okada, and T. Osaka, Chem. Lett., N.1 (1996)
|
27 |
D. T. Burns, A. Townshend, and A. H. Carter, Inorganic Reaction Chemistry, 2, 140, Ellis Horwood, Chichester (1981)
|
28 |
F. Feigl and V. Anger, Spot Tests in Inorganic Analysis, 6th ed., 195 (1972)
|
29 |
International Standard ISO 9227 (1990)
|
30 |
IUPAC, Reagent and Reactions for Qualitative Inorganic Analysis, 5th Report, Butterworths, London (1964)
|
31 |
W. F. Jones, Mikrochim. Acta, 88 (1961)
|
32 |
J. H. Lindsay, Plating & Surface Finishing, 8, 32 (2001)
|
33 |
H. Marchart, Anal. Chim. Acta, 30, 11 (1964)
DOI
|
34 |
A. J. Kubicek, 'Encyclopedia of Chemical Processing and Design' Dekker, 8, 303 (1979)
|
35 |
KS D 9502 (2005)
|
36 |
W. H. Hartford, 'Encyclopedia of chemical technology' 3rd. ed. Wiley & Sons 6, 82 (1984)
|
37 |
G. A. Prentice and K. S. Chen, J. Appli. Electrochem., 28, 971 (1998)
DOI
ScienceOn
|
38 |
Pyomyonchurri Journal, 171, 18 (2006)
|
39 |
M. Schlesinger and M. Paunovic, 'Modern Electroplating' 4th ed. N. V. Mandich & D. L. Snyder, 289, John Wiley & Sons, Inc, New York (2000)
|
40 |
N. A. Tananaev and Z. Anorg. Allgem. Chem., 140, 320 (1924)
DOI
|
41 |
Pyomyonchurri Journal, 173, 24 (2006)
|