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Determination of Crystal Size and Microstrain of $CeO_2$ by Rietveld Structure Refinement  

Hwang, Gil-Chan (Department of Earth and Environmental Sciences and Research Institute of Natural Sciences, Gyeongsang National University)
Choi, Jin-Beom (Department of Earth and Environmental Sciences and Research Institute of Natural Sciences, Gyeongsang National University)
Publication Information
Journal of the Mineralogical Society of Korea / v.21, no.2, 2008 , pp. 201-208 More about this Journal
Abstract
Ceria ($CeO_2$) becomes one of important functional nanomaterials and a key abrasive material for chemical-mechanical planarization (CMP) of advanced integrated circuits in silicon semi-conductor technology. Two synthetic crystalline ceria (RT735, RT835) are studied by the Rietveld structural refinement to determine crystallite size and microstrain. Rietveld indices of RT735 and RT835 indicate good fitting with $R_p(%)=8.50$, 8.34; $R_{wp}(%)=13.4$, 13.5; $R_{exp}(%)=11.3$, 11.5; $R_B(%)=2.21$, 2.36; S(GofF: Goodness of fit)=1.2, 1.2, respectively. $CeO_2$ with space group Fm3m show a=5.41074(2), 5.41130(6) ${\AA}$, V=158.406(1), 158.455(3)${\AA}^3$ in dimension. Detailed Rietveld refinement reveals that crystallite size and microstrain are 37.42(1) nm, 0.0026 (RT735) and 72.80(2) nm, 0.0013 (RT835), respectively. It also shows that crystallite size and microstrain of ceria are inversely proportional to each other.
Keywords
ceria; chemical-mechanical planariaation (CMP); Rietveld method; crystallite size; microstrain;
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