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http://dx.doi.org/10.6111/JKCGCT.2020.30.1.012

Effects of heat-treatment on the properties of ITO films on transparent polyimide substrates by RF magnetron sputtering  

Kim, Hae-Chan (BON Co., Ltd.)
Cho, Hyun (Department of Nanomechatronics Engineering, Pusan National University)
Kim, Jin-Kon (Department of Nanomechatronics Engineering, Pusan National University)
Publication Information
Journal of the Korean Crystal Growth and Crystal Technology / v.30, no.1, 2020 , pp. 12-16 More about this Journal
Abstract
Indium tin oxide (ITO) films were prepared onto transparent polyimide (PI) substrates by RF magnetron sputtering at room temperature. The deposited ITO films were heat-treated at various temperatures (50, 100, 150, and 200℃). The effect of post heat-treatment temperature on structural, electrical and optical properties of ITO films were investigated. It was found that the as-deposited ITO films were amorphous and the degree of crystallinity and the grain size increased with an increasing heat-treatment temperature, which led to the increase in carrier concentration and mobility. The electrical resistivity of as-deposited ITO films was 2.73 × 10-3 Ω·cm. With the heat-treatment temperature increasing from 50 to 200℃, the electrical resistivity decreased from 2.93 × 10-3 to 1.21 × 10-4 Ω·cm. The average transmittance (400~800 nm) of the ITO deposited PI substrates was decreasing with post heat-treatment temperature and was above 81 % for the temperatures 50~150℃ and decreased considerably to 78 % at 200℃.
Keywords
Indium tin oxide (ITO); Transparent PI substrate; Heat-treatment; Resistivity; Optical transmittance;
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  • Reference
1 R.B.H. Tahar, T. Ban, Y. Ohya and Y. Takahashi, "Tin doped indium oxide thin films: Electrical properties", J. Appl. Phys. 83 (1998) 2631.   DOI
2 K.L. Chopra, S. Major and D.K. Pandya, "Transparent conductors-A status review", Thin Solid Films 102 (1983) 1.   DOI
3 T. Minami, "Present status of transparent conduction oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes", Thin Solid Films 516 (2008) 5822.   DOI
4 H. Kim, A. Pique, J.S. Horwitz, H. Mattoussi, H. Murata, Z.H. Kafafi and B. Chrisey, "Indium tin oxide thin films for organic light-emitting devices", Appl. Phys. Lett. 74 (1999) 3444.   DOI
5 H. Liu, V. Avrutin, N. Izyumskaya, U. Ozgur and H. Morkoc, "Transparent conducting oxides for electrode applications in light emitting and absorbing devices", Superlattices and Microstructures 48 (2010) 458.   DOI
6 G. Cui, D. Wu, S. Qi, S. Jin, Z. Wu and R. Jin, "Preparation of $SnO_2$ nanolayer on flexible polyimide substrates via direct ion exchange and in situ oxidation process", Appl. Mater. Interfaces 3 (2011) 789.   DOI
7 C. Guillen and J. Herrero, "Transparent electrodes based on metal and metal oxide stacked layers grown at room temperature on polymer substrate", Phys. Status Solidi A 207 (2010) 1563.   DOI
8 N. Shirahata and A. Hozumi, "Etchingless micro fabrication of a thick metal oxide film on a flexible polymer substrate", Chem. Mater. 17 (2005) 20.   DOI
9 S. Yang, D. Wu, S. Qi, G. Cui, R. Jin and Z. Wu, "Fabrication of highly reflective and conductive double-surface-silvered layers embedded on polymeric films through all-wet process at room temperature", J. Phys. Chem. B 113 (2009) 9694.   DOI
10 A.M. Ektessab and S. Hakamata, "XPS study of ion beam modified polyimide films", Thin Solid Films 377-378 (2000) 621.   DOI
11 A.E. Lozano, J. de Abajo, J.G. de la Campa, C. Guillen, J. Herrero and M.T. Gutierrez, "Thin film polyimide/indium tin oxide composites for photovoltaic applications", J. Appl. Polym. Sci. 103 (2007) 3491.   DOI
12 A.B. Chebotareva, G.G. Untila, T.N. Kost, S. Jorgensen and A.G. Ulyashin, "ITO deposited by pyrosol for photovoltaic applications", Thin Solid Films 515 (2007) 8505.   DOI
13 Z. Xu, P. Chen, Z. Wu, F. Xu, G. Yang, B. Lin, C. Tan, L. Zhang, R. Zhang and Y. Zheng, "Influence of thermal annealing on electrical and optical properties of indium tin oxide thin films", Mater. Sci. Semicond. Proc. 26 (2014) 588.   DOI
14 S. Ohno, Y. Kawaguchi, A. Miyamura, Y. Sato, P.K. Song, M. Yoshikawa, P. Frach and Y. Shigesato, "High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems", Sci. Technol. Adv. Mater. 7 (2006) 56.   DOI
15 M. Gulen, G. Yildirim, S. Bal, A. Varilci, I. Belenli and M. Oz, "Role of annealing temperature on microstructural and electro-optical properties of ITO films produced by sputtering", J. Mater. Sci.: Mater. Electron. 24 (2013) 467.   DOI
16 S.D. Senol, A. Senol, O. Ozturk and M. Erdem, "Effect of annealing time on the structural, optical and electrical characteristics of DC sputtered ITO thin films", J. Mater. Sci.: Mater. Electron. 25 (2014) 4992.   DOI
17 C.J. Lee, H.K. Lin, C.H. Li, L.X. Chen, C.C. Lee, C.W. Wu and J.C. Huang, "A study on electric properties for pulse laser annealing of ITO film after wet etching", Thin Solid Films 522 (2012) 330.   DOI
18 Y. Hu, X. Diao, C. Wang, W. Hao and T. Wang, "Effects of heat treatment on properties of ITO prepared by rf magnetron sputtering", Vacuum 75 (2004) 183.   DOI
19 S.H. Kim, N.M. Park, T.Y. Kim and G.Y. Sung, "Electrical and optical characteristics of ITO films by pulsed laser deposition using a 10 wt% $SnO_2$-doped $IN_2O_3$ ceramic target", Thin Solid Films 475 (2005) 262.   DOI