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http://dx.doi.org/10.6111/JKCGCT.2017.27.1.022

Effect of processing parameters on TiO2 film by room temperature granule spray in vacuum  

Kim, Han-Gil (Department of Materials Science and Engineering, Pukyong National University)
Park, Yoon-Soo (Department of Materials Science and Engineering, Pukyong National University)
Bang, Kook-Soo (Department of Advanced Materials System Engineering, Pukyong National University)
Park, Dong-Soo (Functional Materials Group, Korea Institute of Machinery and Materials)
Park, Chan (Department of Materials Science and Engineering, Pukyong National University)
Publication Information
Journal of the Korean Crystal Growth and Crystal Technology / v.27, no.1, 2017 , pp. 22-27 More about this Journal
Abstract
$TiO_2$ films, thickness of $1{\sim}30{\mu}m$ were deposited on glass substrate at room temperature by room temperature granule spray in vacuum. The starting powder was calcinated at $600^{\circ}C$ for 4 h using $Al_2O_3$ crucible in the furnace. The particle size of the $TiO_2$, $1.5{\mu}m$ was measured by a particle size analyzer. The effect of different process parameters such as number of pass, gas flow rate and feeder voltage was studied. As the number of passes increased, the film thickness increased proportionally due to adequate kinetic energy conserved. The effect of three different flow rates (i.e. 15, 25, and 35 LPM) on deposited film was investigated. As gas flow rate increased, the film thickness increased up to 25 LPM and then decreased. Higher feeder voltage with low flow rate of 15 LPM resulted in unsufficient coating thickness due to insufficient kinetic energy. Microstructure of $TiO_2$ films was investigated by scanning electron microscope and high resolution tramission electron microscope.
Keywords
$TiO_2$ granule powder; Room temperature granule spray in vacuum process; Aerosol deposition method; Film thickness; Number of pass; Gas flow rate; Feeder voltage;
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Times Cited By KSCI : 1  (Citation Analysis)
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