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http://dx.doi.org/10.6111/JKCGCT.2013.23.2.86

Silicon surface texturing for enhanced nanocrystalline diamond seeding efficiency  

Park, Jong Cheon (Department of Nano Fusion Technology, Pusan National University)
Jeong, Ok Geun (Department of Nano Fusion Technology, Pusan National University)
Kim, Sang Youn (Department of Nano Fusion Technology, Pusan National University)
Park, Se Jin (Department of Nanomechatronics Engineering, Pusan National University)
Yun, Young-Hoon (Department of Hydrogen & Fuel Cell Technology, Dongshin University)
Cho, Hyun (Department of Nanomechatronics Engineering, Pusan National University)
Publication Information
Journal of the Korean Crystal Growth and Crystal Technology / v.23, no.2, 2013 , pp. 86-92 More about this Journal
Abstract
$SF_6/O_2$ inductively coupled plasmas were employed to texture Si surface as a pretreatment for nanocrystalline diamond film growth. It was found that the $SF_6/O_2$ plasma texturing provided a very wide process window where normalized roughness values in the range of 2~16 could be obtained. Significantly improved nucleation densities of ${\sim}6.5{\times}10^{10}cm^{-2}$ compared to conventional mechanical abrasion were achieved after seeding for the textured Si substrate.
Keywords
Nanocrystalline diamond seeding; Si surface texturing; Fluorine-based plasma; Surface roughness; Nucleation density;
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Times Cited By KSCI : 2  (Citation Analysis)
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