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http://dx.doi.org/10.6111/JKCGCT.2010.20.6.254

Investigation of aluminum-induced crystallization of amorphous silicon and crystal properties of the silicon film for polycrystalline silicon solar cell fabrication  

Jeong, Hye-Jeong (Solar City Center, Korea Institute of Industrial Technology)
Lee, Jong-Ho (Solar City Center, Korea Institute of Industrial Technology)
Boo, Seong-Jae (Solar City Center, Korea Institute of Industrial Technology)
Abstract
Polycrystalline silicon (pc-Si) films are fabricated and characterized for application to pc-Si thin film solar cells as a seed layer. The amorphous silicon films are crystallized by the aluminum-induced layer exchange (ALILE) process with a structure of glass/Al/$Al_2O_3$/a-Si using various thicknesses of $Al_2O_3$ layers. In order to investigate the effects of the oxide layer on the crystallization of the amorphous silicon films, such as the crystalline film detects and the crystal grain size, the $Al_2O_3$ layer thickness arc varied from native oxide to 50 nm. As the results, the defects of the poly crystalline films are increased with the increase of $Al_2O_3$ layer thickness, whereas the grain size and crystallinity are decreased. In this experiments, obtained the average pc-Si sub-grain size was about $10\;{\mu}m$ at relatively thin $Al_2O_3$ layer thickness (${\leq}$ 16 nm). The preferential orientation of pc-Si sub-grain was <111>.
Keywords
Aluminum-induced crystallization (AIC); Amorphous silicon; Crystallization; Poly-crystalline silicon film; Solar cell;
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