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Phase transformation and magnetic properties of $Ni_xFe_{100-x}$ thin films deposited by a co-sputtering  

Kang, Dae-Sik (Electronic Components Center, Optic & Electronic Ceramics Division, Korea Institute of Ceramic Engineering and Technology)
Song, Jong-Han (Electronic Components Center, Optic & Electronic Ceramics Division, Korea Institute of Ceramic Engineering and Technology)
Nam, Joong-Hee (Electronic Components Center, Optic & Electronic Ceramics Division, Korea Institute of Ceramic Engineering and Technology)
Cho, Jeong-Ho (Electronic Components Center, Optic & Electronic Ceramics Division, Korea Institute of Ceramic Engineering and Technology)
Chun, Myoung-Pyo (Electronic Components Center, Optic & Electronic Ceramics Division, Korea Institute of Ceramic Engineering and Technology)
Publication Information
Journal of the Korean Crystal Growth and Crystal Technology / v.19, no.6, 2009 , pp. 282-287 More about this Journal
Abstract
$Ni_xFe_{100-x}$ films with a thickness of about 100nm were deposited on Si(100) substrates at room temperature by a DC magnetron co-sputtering using Fe and Ni targets. Compositional, structural, electrical and magnetic properties of the films were investigated. $Ni_{67}Fe_{33}$, $Ni_{55}Fe_{45}$, $Ni_{50}Fe_{50}$, $Ni_{45}Fe_{55}$, $Ni_{40}Fe_{60}$ films are obtained by increasing the sputtering power of the Fe target. The films of x < 55 have BCC structure and show the phase transformation after annealing at the range of $300{\sim}450^{\circ}C$ for 2 h. On the other hand, the films of x < 50 have the mixed crystalline phases of BCC and FCC after the annealing treatment. The saturation magnetization was decreased initially by the phase transformation effect but then increased again after annealing at $450^{\circ}C$ due to the grain growth and crystallization of BCC phases.
Keywords
NiFe thin film; Soft magnetics; Phase transformation;
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