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Property of molecular beam epitaxy-grown ZnSe/GaAs  

Kim, Eun-Do (R & D Center ALPHA PLUS Co., Ltd.)
Son, Young-Ho (R & D Center ALPHA PLUS Co., Ltd.)
Cho, Seong-Jin (Department of Physics, Kyungsung University)
Hwang, Do-Weon (R & D Center ALPHA PLUS Co., Ltd.)
Abstract
We have installed an ultra high vacuum (UHV) molecular beam epitaxy (MBE) system and investigated into the characteristics of MBE-grown ZnSe/GaAs [001] using scanning electron microscopy (SEM), atomic force microscopy (AFM), we confirmed that layer's surface was dense and uniform of molecular layer. We used x-ray diffractometer (XRD) and confirmed two peaks correspond to GaAs [001] substrate and ZnSe epilayer, respectively. We observed photoluminescence (PL) peak approximately at 437 nm and measured PL mapping of 2 inch ZnSe epilayer.
Keywords
Ultra high vacuum (UHV); Molecular beam epitaxy (MBE); Effusion cell; plasma cell; ZnSe;
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