1 |
H. Machida, K. Hoshikawa and T. Fukuda, 'Unstable forming of rutile crystal grown by EFG method', Pro. the 12th KACG tech. meeting and the 4th Korea-Japan EMGS (1997) 159
|
2 |
H. Machida and T. Fukuda, 'Difficulties encountered during the Czochralski growth of single crystals', J. of Crystal Growth 112 (1991) 835
DOI
ScienceOn
|
3 |
A. Muhlbauer and W. Erdmann, 'Electrodynamic convection in silicon floating zones', J. Crystal Growth 64 (1979) 529
|
4 |
M. Higuchi, T. Togi and K. Kodaira, 'Growth of rutile single crystals by the pulling-down method', J. Crystal Growth 230 (1999) 450
|
5 |
Y. Sakatani, J. Nunoshige, H. Ando, K Okusako, H. Koikem, T. Takata, IN. Kondo, M. Hara and K.comen, 'Photocatalytic decomposition of acetaldehyde under visible light irradiation over ' , Chemistry Letters 32(12) (2003) 1156
DOI
ScienceOn
|
6 |
M. Higuchi, C. Sato and K Kodaira, 'High-speed float zone growth of rutile single crystals inclined at 48o to the c-axis', J. Crystal Growth 269 (2004) 342
DOI
|
7 |
lK Park, K.B. Shim, KH. Auh and I. Tanaka, 'Growth of (rutile) single crystal by FZ method under high oxygen pressure', J. the Korean Crystal Growth and Crystal Technology 11(3) (2001) 85
|
8 |
J.K. Park, K.H. Kim, I. Tanaka and K.B. Shim, 'Characteristics of rutile single crystals grown under two different oxygen partial pressures', J. Crystal Growth 268 (2004) 103
DOI
|
9 |
R.F. Sekerka, R.A. Hartzell and B. J. Farr, 'Instability phenomena during the RF heating and melting of ceramics', J. Crystal Growth 50 (1980) 787
|
10 |
S. Miyazawa, 'Optical crystals survived in information technology systems', Opto-electronics review 11 (2) (2003) 79
|