[KSCI] Korea Science Citation Index Service

Structural, electrical and optical properties of Al-doped ZnO thin films by pulsed DC magnetron sputtering

Ko, Hyung-Duk (Advanced Material Process of Information Technology, Sungkyunkwan University)
Lee, Choong-Sun (Advanced Material Process of Information Technology, Sungkyunkwan University)
Kim, Ki-Chul (Information Storage Device, Electronics and Telecommunications Research Institut)
Lee, Jae-Seok (Division of Material Science and Engineering, Korea University)
Tai, Weon-Pil (Institute of Advanced Materials, Inha University)
Suh, Su-Jeong (Advanced Material Process of Information Technology, Sungkyunkwan University)
Kim, Young-Sung (Advanced Material Process of Information Technology, Sungkyunkwan University)

Publication Information

Journal of the Korean Crystal Growth and Crystal Technology / v.14, no.4, 2004 , pp. 145-150 More about this Journal

Abstract

We have investigated the structural, electrical and optical properties of Al-doped ZnO (AZO) thin films grown on glass substrate by pulsed DC magnetron sputtering as functions of pulse frequency and substrate temperature. A highly c-axis oriented AZO thin film is grown in perpendicular to the substrate when pulse frequency of 30 kHz and substrate temperature of $400^{\circ}C$ was applied. Under this optimized growth condition, the resistivity of AZO thin films exhibited $7.40\times 10^{-4}\Omega \textrm{cm}$ . This indicated that the decrease of film resistivity resulted from the improvement of film crystallinity. The optical transmittance spectra of the films showed a very high transmittance of 85∼90 % in the visible wavelength region and exhibited the absorption edge of about 350 nm. The results show the potential application for transparent conductivity oxide (TCO) thin films.

Keywords

Pulsed DC magnetron sputter; Al-doped ZnO; Pulse frequency; Substrate temperature; Optical properties;

Citations & Related Records

Reference

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