Synthesis and characterization of GaN nanoparticles by pulsed laser deposition

GaN nanoparticles were synthesized by the pulsed laser deposition (PLD) process on $SiO_2$substrate after irradiating the surface of the GaN sintered pellet by the ArF (193 nm) excimer laser. At this moment Ar gas pressure of 100 Pa, 50 Pa, 10 Pa and 1 Pa were applied during the ablation process and laser power of 100 mJ and 200 mJ were also applied. The synthesized fan nanoparticles were characterized by XRD, SEM, TEM, XPS and optical absorption spectra. The synthesized GaN nanoparticles had the crystallite sizes of 20~30 nm, and besides, GaN nanoparticles synthesized under low Ar gas pressure compared to the others corresponded with stoichiometry, and the optical band edge of the GaN nanoparticles was blueshifted.

펄스레이저증착법에 의한 GaN 나노입자의 합성 및 특성분석

ArF(193nm) 엑시머 레이저를 이용한 펄스레이저증착법(PLD)에 의해 GaN 소결체를 타겟 재료로 하여 $SiO_2$기판위에 GaN nanoparticles를 합성하였다. PLD 공정 중에는 100Pa, 50Pa, 10Pa및 1 Pa의 Ar gas 압력과 100mJ 및 200mJ의 레이저 에너지를 가하였다. 합성된 GaN nanoparticles는 XRD, SEM, TEM, XPS 및 optical absorption spectra 등에 의해 분석되었다. 합성된 GaN nanoparticles는 대체적으로 20~30nm의 입경을 갖는 균일한 분포를 하고 있었다. 또한, Ar 기체 압력이 낮아짐에 따라 합성된 GaN nanoparticles의 stoichiometry가 향상되고 optical band edge가 blueshift 경향을 나타내었다.