Effects of Growth Rate and III/V Ratio on Properties of AlN Films Grown on c-Plane Sapphire Substrates by Plasma-Assisted Molecular Beam Epitaxy |
Lim, Se Hwan
(Graduate School of Energy Science and Technology, Chungnam National University)
Shin, Eun-Jung (Graduate School of Energy Science and Technology, Chungnam National University) Lee, Hyo Sung (Department of Materials Science and Engineering, Chungnam National University) Han, Seok Kyu (Department of Materials Science and Engineering, Chungnam National University) Le, Duc Duy (Department of Materials Science and Engineering, Chungnam National University) Hong, Soon-Ku (Department of Materials Science and Engineering, Chungnam National University) |
1 | S. Nakamura, M. Senoh and T. Mukai, Jpn. J. Appl. Phys., 32 L8 (1993). DOI |
2 | J. Wu, W. Walukiewicz, K. M. Yu, J.W. Ager, E. E. Haller, H. Lu, W. J. Schaff, Y. Saito and Y. Nanishi, Appl. Phys. Lett., 80, 3967 (2002). DOI |
3 | ISO 21348 Definitions of Solar Irradiance Spectral Categories. Space Environment Technologies Home Page. Retrieved June 6, 2019 from http://www.spacewx.com/pdf/SET_21348_2004.pdf. |
4 | J.-Y. Shin, S.-J. Kim, D.-K. Kim and D.-H. Kang, Appl. Environ. Microbiol., 82, 2 (2016). DOI |
5 | Y. Nagasawa and A. Hirano, Appl. Sci., 8, 1264 (2018). DOI |
6 | M. Kneissl, F. Mehnke, C. Kuhn, C. Reich, M. Guttmann, J. Enslin, T. Wernicke, A. Knauer, V. Kueller, U. Zeimer, M. Lapeyrade, J. Rass, N. Lobo-Ploch, T. Kolbe, J. Glaab, S. Einfeldt and M. Weyers, 2015 IEEE Summer Top. Meet. Ser., p.9 (2015). |
7 | P. B. Perry and R. F. Rutz, Appl. Phys. Lett., 33, 319 (1978). DOI |
8 | T. Onuma, S. F. Chichibu, T. Sota, K. Asai, S. Sumiya, T. Shibata and M. Tanaka, Appl. Phys. Lett., 81, 652 (2002). DOI |
9 | W. M. Yim, E. J. Stofko, P. J. Zanzucchi, J. I. Pankove, M. Ettenberg and S. L. Gilbert, J. Appl. Phys., 44, 292 (1973). DOI |
10 | L. Chen, B. J. Skromme, R. F. Dalmau, R. Schlesser, Z. Sitar, C. Chen, W. Sun, J. Yang, M. A. Khan, M. L. Nakarmi, J. Y. Lin and H.-X. Jiang, Appl. Phys. Lett., 85, 4334 (2004). DOI |
11 | A. Khan, K. Balakrishnan and T. Katona, Nat. Photonics., 2, 77 (2008). DOI |
12 | V. Adivarahan, A. Heidari, B. Zhang, Q. Fareed, M. Islam, S. Hwang, K. Balakrishnan and A. Khan, Appl. Phys. Express, 2, 092102 (2009). DOI |
13 | H. Hirayama, Y. Tsukada, T. Maeda, N. Kamata, Appl. Phys. Express., 3, 031002 (2010). DOI |
14 | B. P. Yonkee, E. C. Young, S. P. DenBaars, S. Nakamura and J. S. Speck, Appl. Phys. Lett., 109 , 191104 (2016). DOI |
15 | Y. Liao, C. Thomidis, C. Kao and T. D. Moustakas, Appl. Phys. Lett., 98, 081110 (2011). DOI |
16 | H. Hirayama, S. Fujikawa, N. Noguchi, J. Norimatsu, T. Takano, K. Tsubaki and N. Kamata, Phys. Status Solidi A, 206, 1176 (2009). DOI |
17 | Q. X. Guo, K. Yahata, T. Tanaka, M. Nishio and H. Ogawa, J. Cryst. Growth., 257, 123 (2003). DOI |
18 | M. Kneissl, T. Kolbe, C. Chua, V. Kueller, N. Lobo, J. Stellmach, A. Knauer, H. Rodriguez, S. Einfeldt, Z. Yang, N. M. Johnson and M. Weyers, Semicond. Sci. Technol., 26, 014036 (2010). DOI |
19 | T. M. Altahtamouni, J. Y. Lin and H. X. Jiang, AIP Adv., 4, 047122 (2014). DOI |
20 | M. A. Khan, N. Maeda, M. Jo, Y. Akamatsu, R. Tanabe, Y. Yamada and H. Hirayama, J. Mater. Chem. C., 7, 143 (2019). DOI |
21 | J. Bai, T. Wang, P. J. Parbrook, K. B. Lee and A. G. Cullis, J. Cryst. Growth., 282, 290 (2005). DOI |
22 | L. Lu, B. Shen, F. J. Xu, J. Xu, B. Gao, Z. J. Yang, G. Y. Zhang, X. P. Zhang, J. Xu and D. P. Yu, J. Appl. Phys., 102, 033510 (2007). DOI |