Effect of V/III Ratio Variation on the Properties of AlN Epilayers in HVPE
![]() |
Son, Hoki
(Korea Institute of Ceramic Engineering & Technology)
Lim, Tae-Young (Korea Institute of Ceramic Engineering & Technology) Lee, Mijai (Korea Institute of Ceramic Engineering & Technology) Kim, Jin-Ho (Korea Institute of Ceramic Engineering & Technology) Kim, Younghee (Korea Institute of Ceramic Engineering & Technology) Hwang, Jonghee (Korea Institute of Ceramic Engineering & Technology) Oh, Hae-Kon (LumiGNtech Co.) Choi, YoungJun (LumiGNtech Co.) Lee, Hae-Yong (LumiGNtech Co.) Kim, Hyung Sun (School of Materials Science and Engineering, Inha University) |
1 | M. Balaji, A. Claudel, V. Fellmann, I. Gelard, E. Blanquet, R. Boichot, A. Pierret B. Attal-Tretout, A. Crisci, S. Coindeau, H. Roussel, D. Pique, K. Baskar and M. Pons, J. Alloy. Comp., 526, 103 (2012). DOI ScienceOn |
2 | Yuta Takagi, Reina Miyagawa, Hideto Miyake and Kazumasa Hiramatsu, Phys. Status Solidi C, 9(3-4), 576 (2012). DOI ScienceOn |
3 | Toru Nagashima, Manabu Harada, Hiroyuki Yanagi, Hiroyuki Fukuyama, Yoshinao Kumagai, Akinori Koukitu and Kazuya Takada, J. Cryst. Growth, 305, 355 (2007). DOI ScienceOn |
4 | Yoshinao Kumagai, YuukiEnatsu, MasanariIshizuki, YukiKubota, JumpeiTaj ima, Toru Nagashima, HisashiMurakami, KazuyaTakada and AkinoriKoukitu, J. Cryst. Growth, 312, 2530 (2010). DOI ScienceOn |
5 | Yoshino Kumagai, Hiroshi Shikauchi, Jun Kikuchi, Takayoshi Yamane, Yoshihiro Kangawa and Akinori Koukitu, Proc. 21st century COE Joint Workshop on Bulk Nitrides IPAP Conf. Series 4 pp.9-13 (2003) |
6 | S. Corekc-i, M.K.Ozturk, M.Cakmak, S.Ozc-elik and E.Ozbay, Mater. Sci. Semicond. Process Volume 15, Issue 1, pp 32-36, February (2012). DOI ScienceOn |
7 | Masataka Imura, Kiyotaka Nakano, Naoki Fujimoto, Narihito Okada, Krishnan Balakrishnan, Motoaki Iwaya, Satoshi Kamiyama, Hiroshi Amano, Isamu Akasaki, Tadashi Noro, Takashi Takagi and Akira Bandoh, Jpn. J. Appl. Phys., 45(11), 8639 (2006). DOI |
8 | Yu-Huai Liu, Tomoaki Tanabe, Hideto Miyake, Kazumasa Hiramatsu, Tomohiko Shibata, Mutsuhiro Tanaka and Toshihiko Masa, Jpn. J. Appl. Phys., 44(17), L505 (2005). DOI ScienceOn |
9 | D. G. Zhao, J. J. Zhu, D. S. Jiang, Hui Yang, J. W. Liang, X. Y. Li and H. M. Gong, J. Cryst. Growth, 289, 72 (2006). DOI ScienceOn |
10 | J. Bai, T.Wang, P. J. Parbrook, K. B. Lee and A. G. Cullis, J. Cryst. Growth, 282, 290 (2005). DOI ScienceOn |
11 | D. G. Zhao, S. J. Xu, M. H. Xie and S. Y. Tong, Appl phys Lett., 83(4), 28 july (2003). |
12 | Kohei Fujita, Kazuteru Okuura, Hideto Miyake, Kazumasa Hiramatsu, and Hideki Hirayama, Phys. Status Solidi C, 8(5), 1483 (2011). DOI ScienceOn |
13 | J. H. Yang, S. M. Kang, D. V. Dinh and D. H. Yoon, Thin Solid Films, 517, 5057 (2009). DOI ScienceOn |
14 | K. H. Chang, M. S. Kwon and S. I. Cho, J. Institute of Industrial Technology, 12, 123 (2004). |
![]() |