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http://dx.doi.org/10.3740/MRSK.2010.20.2.97

Formation Mechanism of Mesoporous Aluminum Hydroxide Film by Alkali Surface Modification  

Seo, Young-Ik (Division of Materials Science and Engineering, Hanyang University)
Jeon, Yong-Jin (Division of Materials Science and Engineering, Hanyang University)
Lee, Young-Jung (Division of Materials Science and Engineering, Hanyang University)
Kim, Dae-Gun (Division of Materials Science and Engineering, Hanyang University)
Lee, Kyu-Hwan (Computational Science Center, Korea Institute of Science and Technology)
Kim, Young-Do (Division of Materials Science and Engineering, Hanyang University)
Publication Information
Korean Journal of Materials Research / v.20, no.2, 2010 , pp. 97-103 More about this Journal
Abstract
In this study, a new, relatively simple fabrication method for forming a mesoporous $Al(OH)_3$ film on Al substrates was demonstrated. This method, i.e., alkali surface modification, was simply comprised of dipping the substrate in a $5\times10^{-3}$ M NaOH solution at $80^{\circ}C$ for one minute and then immersing it in boiling water for 30 minutes. After alkali surface modification, a mesoporous $Al(OH)_3$ film was formed on the Al substrate, and its chemical state and crystal structure were confirmed by XPS and TEM. According to the results of the XPS analysis, the flake-like morphology after the alkali surface modification was mainly composed of $Al(OH)_3$, with a small amount of $Al_2O_3$. The mesoporous $Al(OH)_3$ layer was composed of three regions: an amorphousrich region, a region of mixed amorphous and crystal domains, and a crystalline-rich region near the $Al(OH)_3$ layer surface. It was confirmed that the stabilization process in the alkali surface modification strongly influenced the crystallization of the mesoporous $Al(OH)_3$ layer.
Keywords
akali surface modification; aluminum hydroxide; mesoporous surface; gibbsite;
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