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http://dx.doi.org/10.3740/MRSK.2009.19.6.313

Low Temperature Annealing Effect of PFO-Poss Emission Layer on the Properties of Polymer Light Emitting Diodes  

Gong, Su-Cheol (Department of Electronic Engineering, Dankook University)
Chang, Ho-Jung (Department of Electronic Engineering, Dankook University)
Publication Information
Korean Journal of Materials Research / v.19, no.6, 2009 , pp. 313-318 More about this Journal
Abstract
Polymer Light Emitting Diodes (PLEDs) with an ITO/PEDOT:PSS/PVK/PFO-poss/LiF/Al structure were prepared on plasma-treated ITO/glass substrates using spin-coating and thermal evaporation methods. The annealing effects of the PFO-poss film when it acts as the emission layer were investigated by using electrical and optical property measurements. The annealing conditions of the PFO-poss emission film were 100 and $200^{\circ}C$ for 1, 2 and 3 hours, respectively. The luminance increased and the turn-on voltage decreased when the annealing temperature and treatment time increased. After examining the Luminance-Voltage (L-V) properties of the PLED, the maximum luminance was found to be 1497 cd/$m^2$ at 11 V for the device when it was annealed at $200^{\circ}C$ for 3 hours. The peak intensity of the PLED emission spectra at approximately 525 nm in wavelength increased when the annealing temperature and time of the PFO-poss film increased. These results suggest that the light emission color shifted from blue to green.
Keywords
polymer light emitting diode (PLED); annealing; luminance; spin coating; emission spectra;
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