Capacitively Coupled SF6, SF6/O2, SF6/CH4 Plasma Etching of Acrylic at Low Vacuum Pressure |
Park, Yeon-Hyun
(School of Nano Engineering, Inje University)
Joo, Young-Woo (School of Nano Engineering, Inje University) Kim, Jae-Kwon (School of Nano Engineering, Inje University) Noh, Ho-Seob (School of Nano Engineering, Inje University) Lee, Je-Won (School of Nano Engineering, Inje University) |
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