Effects of Post-Annealing on Properties of HfO2 Films Grown by ALD
![]() ![]() |
Lee, J.W.
(Information and Electronic Materials Research Laboratory, Department of Materials Science and Engineering, Yonsei University)
Ham, M.H. (Information and Electronic Materials Research Laboratory, Department of Materials Science and Engineering, Yonsei University) Maeng, W.J. (Department of Materials Science and Engineering, Pohang University of Science and Technology) Kim, H. (Department of Materials Science and Engineering, Pohang University of Science and Technology) Myoung, J.M. (Information and Electronic Materials Research Laboratory, Department of Materials Science and Engineering, Yonsei University) |
1 | J. H. Hong, W. J. Choi and J. M. Myoung, Microelectron. Eng., 70(1), 35 (2003) DOI ScienceOn |
2 | Y. Oshita, A. Ogura, A. Hoshino, T. Suzuki, S. Hiiro and H. Machida, J. Cryst. Growth, 235, 365 (2002) DOI ScienceOn |
3 | J. Lee and C. Lee, Kor. J. Mater. Res., 15(11), 741 (2005) 과학기술학회마을 DOI ScienceOn |
4 | E. P. Gusev, C. Cabral Jr., M. Copel, C. D'Emie and M. Gribelyuk, Mieroeleetron. Eng., 69, 145(2003) DOI ScienceOn |
5 | T. H. Moon, M. H. Ham and J. M. Myoung, Appl. Phys. Lett., 86(10), 102903 (2005) DOI ScienceOn |
6 | J.- Y. Zhang., I. W. Boyd, B. J. O'Sullivan, P. K. Hurley, P. V. Kelly and J.-P. Senateur, J. Non-Cryt. Solids, 303, 134 (2002) DOI ScienceOn |
7 | Y. Taur and T.H. Ning, Fundamentals of Modem VLSI Devices (Cambridge University Press, New York, 1998), p. 82-86 |
8 | N. A. Chowdhury, R. Garg and D. Misra, Appl. Phys. Lett., 85, 3289, (2004) DOI ScienceOn |
9 | P. Balk, Adv. Mater., 7, 703 (1995) DOI ScienceOn |
10 | H.S. Momose, M. Ono, T. Yoshitomi, T. Ohguro, S.-I. Nakamura, M. Saito and H. Iwai, IEDM Technical Digest, 593 (1994) DOI |
11 | J. H. Hong, T. H. Moon and J. M. Myoung, Microelectron. Eng., 75, 263 (2004) DOI ScienceOn |
12 | H. J. Song, C. S. Lee and S. W. Kang, Eleetroehem. Solid State Lett., 4, F13, (2001) DOI ScienceOn |
13 | K. Kukli, M. Ritala, T. Sajavaara, J. Keinonen and M. Leskela, Thin Solid Films, 416, 72 (2002) DOI ScienceOn |
14 | K. Kukli, J. Ihanus, M. Ritala and M. Leskela, Appl. Phys. Lett., 68, 3737 (1996) DOI ScienceOn |
15 | B. C. M. Lai, N. H. Kung and J. Y. M. Lee, J. Appl. Phys., 85, 4087 (1999) DOI ScienceOn |
![]() |