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http://dx.doi.org/10.3740/MRSK.2006.16.4.264

The ESCA Analysis of Hydroxyapatite Thin Films Deposited by RF Sputtering  

Jung, Chan-Hoi (Dept. of Materials Science and Engineering, Donga University)
Lee, Jun-Hee (Dept. of Materials Science and Engineering, Donga University)
Kim, Soon-Kook (Dept. of Materials Science and Engineering, Donga University)
Kim, Myung-Han (Dept. of Materials Engineering, Chungbuk National University)
Yu, Jae-Keun (Dept. of Advanced Materials Engineering, Hoseo University)
Kim, Seung-Eon (Korea Institute Machinery & Materials)
Publication Information
Korean Journal of Materials Research / v.16, no.4, 2006 , pp. 264-271 More about this Journal
Abstract
RF sputtering process was applied to produce thin hydroxyapatite(HAp) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the chemical composites between HAp thin films and Ti-6Al-4V alloy substrates were studied. After deposition, the HAp thin films were heat treated for 1h at $400^{\circ}C,\;600^{\circ}C\;and\;800^{\circ}C$ under the atmosphere, and analyzed O/M, FESEM-EDX and ESCA, respectively. Experimental results represented that interface of HAp thin films and Ti-6Al-4V alloy substrates was composed Ti-OH, TiO, TiN, $Al_2O_3,\;V_2O_3,\;VO_2$. pyrophosphate and decreased carbide followed by the increase of heat treatment temperature.
Keywords
Hydroxyapatite; Ti-6Al-4V Alloy; RF Sputtering; Heat Treatment; ESCA;
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