Characteristics of ZrN Films Deposited by Remote PEALD Method Using TDEAZ Precursor |
Cho Seung Chan
(School of Materials Science and Engineering, Pusan National University)
Hwang Yoon Cheol (School of Materials Science and Engineering, Pusan National University) Lee Keun Woo (Division of Materials Science & Engineering, Hanyang University) Han Se Jin (Division of Materials Science & Engineering, Hanyang University) Kim In Bae (School of Materials Science and Engineering, Pusan National University) Jeon Hyeongtag (Division of Materials Science & Engineering, Hanyang University) Kim Yangdo (School of Materials Science and Engineering, Pusan National University) |
1 | O. Kubaschewski, E. L. U. Evans and D. B. Alock, Metallurgical Thermochemistry (Pergamon, Oxford, 1967) |
2 | G. V. Samsonov, Sov. Phys. Tech. Phys., 1, 695 (1967) |
3 | M. A. Nicolet, and S. S. Lau, in VLSI Electronics: Microstructure Science, edited by N. Einspruch and G. Larrabee (Academic, New york, 1978) |
4 | N. Toyama, Solid State Electron, 26, 37 (1983) DOI ScienceOn |
5 | N. Yokoyama, K. Hinode and Y. Homma, J. Electrochem. Soc., 136, 882 (1989) DOI |
6 | M. Takeyama, A. Noya and K. Sakanishi, J. Vac. Sci. Technol., B 18, 1333 (2000) DOI ScienceOn |
7 | J. O. Olowolafe, C. J. Mogab, R. B. Gregort and M. Kottke, J. Appl. Phys., 72, 4099 (1992) DOI |
8 | M. Boumerzong, Z. Pang, M. Boudreau and P. Masher, Appl. Phys. Lett., 66, 302 (1995) DOI ScienceOn |
9 | M. T. Schulberg, M. D. Allendorf and D. A. Outka, J. Vac. Sci. Technol., A 14(6), 3228 (1996) DOI ScienceOn |
10 | M. Ritala, M. Leskel, E. Rauhala and J. Jokinen, J. Electrochem. Soc., 145(8), 2914 (1998) DOI |
11 | M. H. Tasi, S. C. Sun, C. E. Tsai, S. H. Chuang and H. T. Chiu, J. Appl. Phys., 79, 6932 (1996) DOI |
12 | M. Uekubo, T. Oku, K. Nii, M. Murakami, K. Takashiro, S. Yamaguchi, T. Nakano and T. Ohta, Thin Solid Films, 286, 170 (1996) DOI ScienceOn |
13 | T. Oku, E. Kawakami, M. Uekubo, K. Takahiro, S. Yamaguchi and M. Murakami, Appl. Surf. Sci., 99, 265 (1996) DOI ScienceOn |
14 | A. S. Grove, Physics and technology of semiconductor devices, p. 40, Wiley, New York (1967) |
15 | Semiconductor Technology Handbook, 5th edition, Technology Associates, CA (1985) |
16 | Ivo J. Raaijmakers and A. Shennan, VMIC conference, 219 (1990) DOI |
17 | J. D. McBrayer, Diffusion of metals in silicon dioxide, DARPA, MDA 901-82-k-0412 (1983) |